Inventor · disambiguated record
Si-Wen Liao
Also filed as: LIAO SI-WEN
10 granted patents·25 citations·filing 2012–2019
84Inventor score
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10 records- 0189US10161041B2Thermal chemical vapor deposition system and operating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·5 cites·18 claims
- 0280US10864530B2Coating apparatus and method of forming coating filmTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·3 cites·20 claims
- 0380US9607873B2Apparatus and operation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 28, 2017·6 cites·20 claims
- 0479US10867787B2Method for controlling plasma in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·2 cites·20 claims
- 0579US9573144B2Coating apparatus and method of forming coating filmTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 21, 2017·4 cites·20 claims
- 0675US9490152B2Asymmetrical chamber configurationWANG LAN-HAI·Filed 2012·Granted Nov 8, 2016·5 cites·20 claims
- 0754US10724140B2Thermal chemical vapor deposition system and operating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 28, 2020·0 cites·20 claims
- 0848US9631273B2Apparatus for dielectric deposition processWANG LAN-HAI·Filed 2012·Granted Apr 25, 2017·0 cites·19 claims
- 0945US10395918B2Method and system for controlling plasma in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 27, 2019·0 cites·20 claims
- 1042US9324559B2Thin film deposition apparatus with multi chamber design and film deposition methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 26, 2016·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →