Inventor · disambiguated record
Siao-Shan Wang
Also filed as: WANG SIAO-SHAN
15 granted patents·2 pending applications·16 citations·filing 2015–2024
88Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD17
Top patents by PatentIndex Score
17 records- 0192US10672610B2Grafting design for pattern post-treatment in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·4 cites·20 claims
- 0290US11387104B2Grafting design for pattern post-treatment in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 12, 2022·2 cites·20 claims
- 0388US10394123B2Blocking layer material composition and methods thereof in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Aug 27, 2019·4 cites·20 claims
- 0483US10036957B2Post development treatment method and material for shrinking critical dimension of photoresist layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jul 31, 2018·2 cites·20 claims
- 0580US10517179B2Material composition and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 24, 2019·2 cites·20 claims
- 0678US12135502B2Resin, photoresist composition, and method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 5, 2024·0 cites·20 claims
- 0777US10672619B2Material composition and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·1 cites·20 claims
- 0875US2024377739A1Resin, photoresist composition, and method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0972US10866515B2Lithography process using photoresist material with photosensitive functional groupTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 15, 2020·1 cites·20 claims
- 1063US10747114B2Blocking layer material composition and methods thereof in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 18, 2020·0 cites·20 claims
- 1163US2025155804A1Photoresist compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1262US12085855B2Resin, photoresist composition, and method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 10, 2024·0 cites·20 claims
- 1362US10915027B2Post development treatment method and material for shrinking critical dimension of photoresist layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Feb 9, 2021·0 cites·20 claims
- 1462US10863630B2Material composition and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 8, 2020·0 cites·20 claims
- 1561US12211698B2Method composition and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 28, 2025·0 cites·20 claims
- 1644US9810990B2Chemical treatment for lithography improvement in a negative tone development processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Nov 7, 2017·0 cites·20 claims
- 1743US10114291B2Grafting agent for forming spacer layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Oct 30, 2018·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →