Inventor · disambiguated record
Souichi Katagiri
Also filed as: KATAGIRI SOUICHI
30 granted patents·3 pending applications·268 citations·filing 1999–2019
96Inventor score
Top patents by PatentIndex Score
33 records- 0198US7582885B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Sep 1, 2009·61 cites·5 claims
- 0295US7615765B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Nov 10, 2009·23 cites·20 claims
- 0392US7781743B2Charged particle beam system and method for evacuation of the systemHITACHI HIGH TECH CORP·Filed 2008·Granted Aug 24, 2010·16 cites·17 claims
- 0492US7745237B2Pattern forming method and pattern forming systemHITACHI LTD·Filed 2007·Granted Jun 29, 2010·15 cites·17 claims
- 0588US6723144B2Semiconductor device fabricating methodHITACHI LTD·Filed 2002·Granted Apr 20, 2004·38 cites·16 claims
- 0685US8426835B2Charged particle radiation deviceKASUYA KEIGO·Filed 2010·Granted Apr 23, 2013·8 cites·20 claims
- 0782US9837243B2Ion pump and charged particle beam device using the sameHITACHI LTD·Filed 2016·Granted Dec 5, 2017·3 cites·13 claims
- 0881US10903037B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2019·Granted Jan 26, 2021·2 cites·13 claims
- 0978US7759652B2Electron lens and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Jul 20, 2010·4 cites·19 claims
- 1077US6663468B2Method for polishing surface of semiconductor device substrateHITACHI LTD·Filed 2001·Granted Dec 16, 2003·18 cites·19 claims
- 1171US8866371B2Electric field discharge-type electron sourceHITACHI HIGH TECH CORP·Filed 2012·Granted Oct 21, 2014·2 cites·10 claims
- 1271US6390895B1Flattening and machining method and apparatusHITACHI LTD·Filed 2000·Granted May 21, 2002·11 cites·23 claims
- 1370US10804084B2Vacuum apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Oct 13, 2020·1 cites·15 claims
- 1470US8319193B2Charged particle beam apparatus, and method of controlling the sameKASUYA KEIGO·Filed 2009·Granted Nov 27, 2012·2 cites·11 claims
- 1569US6565424B2Method and apparatus for planarizing semiconductor deviceHITACHI LTD·Filed 2001·Granted May 20, 2003·13 cites·2 claims
- 1665US8268209B2Pattern forming method and its moldOGINO MASAHIKO·Filed 2007·Granted Sep 18, 2012·3 cites·7 claims
- 1764US8772735B2Charged particle beam apparatus, and method of controlling the sameKASUYA KEIGO·Filed 2012·Granted Jul 8, 2014·1 cites·14 claims
- 1862US6777337B2Planarizing method of semiconductor wafer and apparatus thereofRENESAS TECH CORP·Filed 2001·Granted Aug 17, 2004·8 cites·22 claims
- 1959US8686380B2Charged particle beam apparatusKATAGIRI SOUICHI·Filed 2009·Granted Apr 1, 2014·1 cites·17 claims
- 2056US6734103B2Method of polishing a semiconductor deviceHITACHI LTD·Filed 2002·Granted May 11, 2004·5 cites·14 claims
- 2156US6589871B2Processing method, measuring method and producing method of semiconductor devicesHITACHI LTD·Filed 2001·Granted Jul 8, 2003·5 cites·6 claims
- 2252US6908860B2Method for manufacturing semiconductor device and apparatus for manufacturing thereofHITACHI LTD·Filed 2003·Granted Jun 21, 2005·3 cites·10 claims
- 2351US11894211B2Electron beam apparatus and method for controlling electron beam apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Feb 6, 2024·0 cites·12 claims
- 2451US11227740B2Electron gun and electron beam application deviceHITACHI HIGH TECH CORP·Filed 2017·Granted Jan 18, 2022·0 cites·9 claims
- 2551US9006654B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Apr 14, 2015·0 cites·15 claims
- 2651US6524961B1Semiconductor device fabricating methodHITACHI LTD·Filed 1999·Granted Feb 25, 2003·14 cites·35 claims
- 2750US6477825B2Flattening and machining method and apparatusHITACHI LTD·Filed 2002·Granted Nov 12, 2002·3 cites·18 claims
- 2849US7144298B2Method for manufacturing semiconductor device and apparatus for manufacturing thereofHITACHI LTD·Filed 2005·Granted Dec 5, 2006·0 cites·4 claims
- 2948US11508544B2Thermoelectric field emission electron source and electron beam application deviceHITACHI HIGH TECH CORP·Filed 2018·Granted Nov 22, 2022·0 cites·21 claims
- 3041US2022199349A1Electron source and charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 3141US2004048554A1Method for polishing surface of semiconductor device substrateHITACHI LTD·Filed 2003·Application pending·0 cites
- 3240US6612912B2Method for fabricating semiconductor device and processing apparatus for processing semiconductor deviceHITACHI LTD·Filed 1999·Granted Sep 2, 2003·8 cites·33 claims
- 3336US2019198284A1Electron source and electron beam irradiation deviceHITACHI HIGH TECH CORP·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →