Inventor · disambiguated record
Sobhy Tadros
Also filed as: TADROS SOBHY
11 granted patents·122 citations·filing 1990–1995
90Inventor score
Files withOCG MICROELECTRONIC MATERIALS11
Top patents by PatentIndex Score
11 records- 0190US5541033ASelected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Jul 30, 1996·37 cites·48 claims
- 0284US5547814AO-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive imagesOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Aug 20, 1996·22 cites·16 claims
- 0382US5602260ASelected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Feb 11, 1997·19 cites·3 claims
- 0469US5196289ASelected block phenolic oligomers and their use in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Mar 23, 1993·15 cites·13 claims
- 0550US5232819ASelected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 3, 1993·4 cites·3 claims
- 0642US5302688ASelected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Apr 12, 1994·5 cites·4 claims
- 0741US5234795AProcess of developing an image-wise exposed resist-coated substrateOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 10, 1993·6 cites·3 claims
- 0841US5151340ASelected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixturesOCG MICROELECTRONIC MATERIALS·Filed 1990·Granted Sep 29, 1992·6 cites·13 claims
- 0939US5235022ASelected block copolymer novolak binder resinsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 10, 1993·5 cites·6 claims
- 1031US5225318ASelected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patternsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Jul 6, 1993·2 cites·4 claims
- 1130US5188921ASelected block copolymer novolak binder resins in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Feb 23, 1993·1 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →