Inventor · disambiguated record
Steven G. Barbee
Also filed as: BARBEE STEVEN G · BARBEE STEVEN GEORGE
47 granted patents·5 pending applications·2,226 citations·filing 1980–2022
99Inventor score
Top patents by PatentIndex Score
52 records- 0197US5559428AIn-situ monitoring of the change in thickness of filmsIBM·Filed 1995·Granted Sep 24, 1996·258 cites·19 claims
- 0297US4400715AThin film semiconductor device and method for manufactureIBM·Filed 1980·Granted Aug 23, 1983·294 cites·7 claims
- 0395US6072313AIn-situ monitoring and control of conductive films by detecting changes in induced eddy currentsIBM·Filed 1997·Granted Jun 6, 2000·163 cites·12 claims
- 0495US5660672AIn-situ monitoring of conductive films on semiconductor wafersIBM·Filed 1995·Granted Aug 26, 1997·155 cites·64 claims
- 0595US5644221AEndpoint detection for chemical mechanical polishing using frequency or amplitude modeIBM·Filed 1996·Granted Jul 1, 1997·135 cites·18 claims
- 0694US11562400B1Uplift modelingIBM·Filed 2021·Granted Jan 24, 2023·3 cites·16 claims
- 0794US4717596AMethod for vacuum vapor deposition with improved mass flow controlIBM·Filed 1986·Granted Jan 5, 1988·138 cites·7 claims
- 0892US5731697AIn-situ monitoring of the change in thickness of filmsIBM·Filed 1996·Granted Mar 24, 1998·108 cites·13 claims
- 0992US4640221AVacuum deposition system with improved mass flow controlIBM·Filed 1985·Granted Feb 3, 1987·113 cites·5 claims
- 1089US6858532B2Low defect pre-emitter and pre-base oxide etch for bipolar transistors and related toolingIBM·Filed 2002·Granted Feb 22, 2005·44 cites·19 claims
- 1188US5220405AInterferometer for in situ measurement of thin film thickness changesIBM·Filed 1991·Granted Jun 15, 1993·65 cites·24 claims
- 1282US5392124AMethod and apparatus for real-time, in-situ endpoint detection and closed loop etch process controlIBM·Filed 1993·Granted Feb 21, 1995·52 cites·40 claims
- 1380US5659492AChemical mechanical polishing endpoint process controlIBM·Filed 1996·Granted Aug 19, 1997·60 cites·24 claims
- 1476US11443235B2Identifying optimal weights to improve prediction accuracy in machine learning techniquesIBM·Filed 2019·Granted Sep 13, 2022·2 cites·25 claims
- 1576US5788801AReal time measurement of etch rate during a chemical etching processIBM·Filed 1997·Granted Aug 4, 1998·49 cites·6 claims
- 1673US5614247AApparatus for chemical vapor deposition of aluminum oxideIBM·Filed 1994·Granted Mar 25, 1997·32 cites·5 claims
- 1772US7502658B1Methods of fabricating optimization involving process sequence analysisIBM·Filed 2008·Granted Mar 10, 2009·9 cites·2 claims
- 1872US5381234AMethod and apparatus for real-time film surface detection for large area wafersIBM·Filed 1993·Granted Jan 10, 1995·36 cites·23 claims
- 1971US5770948ARotary signal coupling for chemical mechanical polishing endpoint detection with a strasbaugh toolIBM·Filed 1996·Granted Jun 23, 1998·36 cites·14 claims
- 2070US5728222AApparatus for chemical vapor deposition of aluminum oxideIBM·Filed 1995·Granted Mar 17, 1998·33 cites·10 claims
- 2169US7953689B2Combined feature creation to increase data mining signal in hybrid datasetsIBM·Filed 2007·Granted May 31, 2011·2 cites·18 claims
- 2269US5648113AAluminum oxide LPCVD systemIBM·Filed 1994·Granted Jul 15, 1997·25 cites·12 claims
- 2368US5663637ARotary signal coupling for chemical mechanical polishing endpoint detection with a westech toolIBM·Filed 1996·Granted Sep 2, 1997·41 cites·22 claims
- 2468US2022292401A1Identifying optimal weights to improve prediction accuracy in machine learning techniquesIBM·Filed 2022·Application pending·0 cites
- 2566US5516399AContactless real-time in-situ monitoring of a chemical etchingIBM·Filed 1994·Granted May 14, 1996·40 cites·18 claims
- 2665US5501766AMinimizing overetch during a chemical etching processIBM·Filed 1994·Granted Mar 26, 1996·26 cites·15 claims
- 2765US5386121AIn situ, non-destructive CVD surface monitorIBM·Filed 1993·Granted Jan 31, 1995·24 cites·14 claims
- 2864US5456788AMethod and apparatus for contactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1995·Granted Oct 10, 1995·25 cites·10 claims
- 2963US6899784B1Apparatus for detecting CMP endpoint in acidic slurriesECOPHYSICS AG·Filed 2002·Granted May 31, 2005·13 cites·8 claims
- 3063US4781970AStrengthening a ceramic by post sinter coating with a compressive surface layerIBM·Filed 1987·Granted Nov 1, 1988·28 cites·47 claims
- 3162US6878629B1Method for detecting CMP endpoint in acidic slurriesIBM·Filed 2002·Granted Apr 12, 2005·8 cites·13 claims
- 3262US5338390AContactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1992·Granted Aug 16, 1994·32 cites·14 claims
- 3358US7895168B2Data mining using variable rankings and enhanced visualization methodsIBM·Filed 2008·Granted Feb 22, 2011·1 cites·20 claims
- 3457US6291351B1Endpoint detection in chemical-mechanical polishing of cloisonne structuresIBM·Filed 2000·Granted Sep 18, 2001·6 cites·14 claims
- 3556US5573624AChemical etch monitor for measuring film etching uniformity during a chemical etching processIBM·Filed 1994·Granted Nov 12, 1996·26 cites·10 claims
- 3656US5540777AAluminum oxide LPCVD systemIBM·Filed 1995·Granted Jul 30, 1996·17 cites·7 claims
- 3756US5445705AMethod and apparatus for contactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1994·Granted Aug 29, 1995·22 cites·10 claims
- 3855US12093838B2Efficient execution of a decision treeIBM·Filed 2020·Granted Sep 17, 2024·0 cites·20 claims
- 3954US9189543B2Predicting service request breachesBADHE YOGESH P·Filed 2011·Granted Nov 17, 2015·2 cites·18 claims
- 4054US6989683B2Enhanced endpoint detection for wet etch process controlIBM·Filed 2004·Granted Jan 24, 2006·3 cites·6 claims
- 4154US5134963ALPCVD reactor for high efficiency, high uniformity depositionIBM·Filed 1991·Granted Aug 4, 1992·15 cites·9 claims
- 4253US5582746AReal time measurement of etch rate during a chemical etching processIBM·Filed 1994·Granted Dec 10, 1996·19 cites·11 claims
- 4353US5500073AReal time measurement of etch rate during a chemical etching processIBM·Filed 1995·Granted Mar 19, 1996·15 cites·15 claims
- 4448US6843880B2Enhanced endpoint detection for wet etch process controlIBM·Filed 2002·Granted Jan 18, 2005·1 cites·7 claims
- 4548US2021342707A1Data-driven techniques for model ensemblesIBM·Filed 2020·Application pending·0 cites
- 4647US2021142213A1Data Partitioning with Quality EvaluationIBM·Filed 2019·Application pending·0 cites
- 4746US5489361AMeasuring film etching uniformity during a chemical etching processIBM·Filed 1994·Granted Feb 6, 1996·15 cites·5 claims
- 4846US5480511AMethod for contactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1994·Granted Jan 2, 1996·13 cites·18 claims
- 4946US2023083118A1Fraud suspects detection and visualizationIBM·Filed 2021·Application pending·0 cites
- 5045US5451289AFixture for in-situ noncontact monitoring of wet chemical etching with passive wafer restraintIBM·Filed 1994·Granted Sep 19, 1995·15 cites·1 claims
Showing the top 50 of 52 patent records by PatentIndex Score.
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