Inventor · disambiguated record
Stephane Ferrasse
Also filed as: FERRASSE STEPHANE
21 granted patents·10 pending applications·251 citations·filing 1999–2023
94Inventor score
Top patents by PatentIndex Score
31 records- 0196US6723187B2Methods of fabricating articles and sputtering targetsHONEYWELL INT INC·Filed 2001·Granted Apr 20, 2004·33 cites·29 claims
- 0295US6908517B2Methods of fabricating metallic materialsHONEYWELL INT INC·Filed 2002·Granted Jun 21, 2005·74 cites·17 claims
- 0393US7767043B2Copper sputtering targets and methods of forming copper sputtering targetsHONEYWELL INT INC·Filed 2008·Granted Aug 3, 2010·18 cites·31 claims
- 0493US6878250B1Sputtering targets formed from cast materialsHONEYWELL INT INC·Filed 1999·Granted Apr 12, 2005·32 cites·8 claims
- 0592US11421311B2ECAE materials for high strength aluminum alloysHONEYWELL INT INC·Filed 2020·Granted Aug 23, 2022·2 cites·20 claims
- 0691US7017382B2Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructionsHONEYWELL INT INC·Filed 2002·Granted Mar 28, 2006·24 cites·18 claims
- 0790US6946039B1Physical vapor deposition targets, and methods of fabricating metallic materialsHONEYWELL INT INC·Filed 2000·Granted Sep 20, 2005·41 cites·28 claims
- 0887US11649535B2ECAE processing for high strength and high hardness aluminum alloysHONEYWELL INT INC·Filed 2019·Granted May 16, 2023·1 cites·15 claims
- 0986US7618520B2Physical vapor deposition target constructionsHONEYWELL INT INC·Filed 2005·Granted Nov 17, 2009·13 cites·17 claims
- 1081US11244815B2Profiled sputtering target and method of making the sameHONEYWELL INT INC·Filed 2018·Granted Feb 8, 2022·2 cites·7 claims
- 1180US10900102B2High strength aluminum alloy backing plate and methods of makingHONEYWELL INT INC·Filed 2017·Granted Jan 26, 2021·1 cites·19 claims
- 1279US12252770B2ECAE processing for high strength and high hardness aluminum alloysHONEYWELL INT INC·Filed 2023·Granted Mar 18, 2025·0 cites·10 claims
- 1372US8702919B2Target designs and related methods for coupled target assemblies, methods of production and uses thereofFERRASSE STEPHANE·Filed 2007·Granted Apr 22, 2014·8 cites·20 claims
- 1471US12217951B2Profiled sputtering target and method of making the sameHONEYWELL INT INC·Filed 2022·Granted Feb 4, 2025·0 cites·20 claims
- 1571US10851447B2ECAE materials for high strength aluminum alloysHONEYWELL INT INC·Filed 2017·Granted Dec 1, 2020·0 cites·8 claims
- 1670US11248286B2ECAE materials for high strength aluminum alloysHONEYWELL INT INC·Filed 2020·Granted Feb 15, 2022·0 cites·9 claims
- 1764US7691240B2Target assemblies, targets, backing plates, and methods of target coolingHONEYWELL INT INC·Filed 2006·Granted Apr 6, 2010·2 cites·18 claims
- 1858US11450516B2Large-grain tin sputtering targetHONEYWELL INT INC·Filed 2020·Granted Sep 20, 2022·0 cites·20 claims
- 1958US11359273B2Frictionless forged aluminum alloy sputtering target with improved propertiesHONEYWELL INT INC·Filed 2016·Granted Jun 14, 2022·0 cites·7 claims
- 2056US10760156B2Copper manganese sputtering targetHONEYWELL INT INC·Filed 2018·Granted Sep 1, 2020·0 cites·22 claims
- 2150US11035036B2Method of forming copper alloy sputtering targets with refined shape and microstructureHONEYWELL INT INC·Filed 2019·Granted Jun 15, 2021·0 cites·19 claims
- 2247US2017287685A1Sputtering target assembly having a graded interlayer and methods of makingHONEYWELL INT INC·Filed 2017·Application pending·0 cites
- 2346US2007251819A1Hollow cathode magnetron sputtering targets and methods of forming hollow cathode magnetron sputtering targetsKARDOKUS JANINE K·Filed 2006·Application pending·0 cites
- 2445US2018202039A1Heat treatment methods for metal and metal alloy preparationHONEYWELL INT INC·Filed 2016·Application pending·0 cites
- 2544US2018323047A1Sputter target backing plate assemblies with cooling structuresHONEYWELL INT INC·Filed 2016·Application pending·0 cites
- 2643US2001047838A1Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructionsFiled 2001·Application pending·0 cites
- 2741US2004256218A1Thin films and methods of forming thin films utilizing ECAE-targetsFiled 2003·Application pending·0 cites
- 2841US2007084527A1High-strength mechanical and structural components, and methods of making high-strength componentsFERRASSE STEPHANE·Filed 2005·Application pending·0 cites
- 2940US2003052000A1Fine grain size material, sputtering target, methods of forming, and micro-arc reduction methodFiled 2002·Application pending·0 cites
- 3040US2004072009A1Copper sputtering targets and methods of forming copper sputtering targetsFiled 2003·Application pending·0 cites
- 3135US2012155501A1Angular extrusion of copper alloy anodesFERRASSE STEPHANE·Filed 2010·Application pending·0 cites
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