Inventor · disambiguated record
Steven Roger Kennedy
Also filed as: KENNEDY STEVEN R · KENNEDY STEVEN ROGER
2 granted patents·19 pending applications·136 citations·filing 1999–2025
60Inventor score
Files withHERAEUS INC14HERAEUS CONAMIC NORTH AMERICA LLC3HERAEUS COVANTICS NORTH AMERICA LLC3DONNELLY CORP1
Top patents by PatentIndex Score
21 records- 0190US6266177B1Electrochromic devicesDONNELLY CORP·Filed 1999·Granted Jul 24, 2001·136 cites·25 claims
- 0266US2025304460A1Ceramic sintered body comprising magnesium aluminate spinelHERAEUS COVANTICS NORTH AMERICA LLC·Filed 2025·Application pending·0 cites
- 0356US2009134015A1Enhanced oxygen non-stoichiometry compensation for thin filmsHERAEUS INC·Filed 2009·Application pending·0 cites
- 0455US12358806B2Ceramic sintered body comprising magnesium aluminate spinelHERAEUS COVANTICS NORTH AMERICA LLC·Filed 2021·Granted Jul 15, 2025·0 cites·14 claims
- 0554US2025296884A1Multilayer sintered ceramic body and method of makingHERAEUS COVANTICS NORTH AMERICA LLC·Filed 2022·Application pending·0 cites
- 0653US2024391836A1Uv-activated red ceramic bodies comprising yag for use in semiconductor processing chambersHERAEUS CONAMIC NORTH AMERICA LLC·Filed 2022·Application pending·0 cites
- 0748US2008166596A1Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloysHERAEUS INC·Filed 2007·Application pending·0 cites
- 0847US2006289294A1Enhanced oxygen non-stoichiometry compensation for thin filmsHERAEUS INC·Filed 2005·Application pending·0 cites
- 0946US2008131735A1Ni-X, Ni-Y, and Ni-X-Y alloys with or without oxides as sputter targets for perpendicular magnetic recordingHERAEUS INC·Filed 2006·Application pending·0 cites
- 1044US2006286414A1Enhanced oxide-containing sputter target alloy compositionsHERAEUS INC·Filed 2005·Application pending·0 cites
- 1143US2006234091A1Enhanced multi-component oxide-containing sputter target alloy compositionsHERAEUS INC·Filed 2005·Application pending·0 cites
- 1242US2005072668A1Sputter target having modified surface textureHERAEUS INC·Filed 2004·Application pending·0 cites
- 1342US2022388909A1Plasma resistant yttrium aluminum oxide bodyHERAEUS CONAMIC NORTH AMERICA LLC·Filed 2020·Application pending·0 cites
- 1442US2023137894A1High purity cordierite material for semiconductor applicationsHERAEUS CONAMIC NORTH AMERICA LLC·Filed 2021·Application pending·0 cites
- 1541US2008170959A1Full density Co-W magnetic sputter targetsHERAEUS INC·Filed 2007·Application pending·0 cites
- 1641US2008057350A1Magnetic media and sputter targets with compositions of high anisotropy alloys and oxide compoundsHERAEUS INC·Filed 2006·Application pending·0 cites
- 1741US2007007130A1Enhanced magnetron sputtering targetHERAEUS INC·Filed 2005·Application pending·0 cites
- 1840US2007253103A1Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter targetHERAEUS INC·Filed 2006·Application pending·0 cites
- 1939US2006042938A1Sputter target material for improved magnetic layerHERAEUS INC·Filed 2004·Application pending·0 cites
- 2035US2005249981A1Grain structure for magnetic recording mediaHERAEUS INC·Filed 2004·Application pending·0 cites
- 2133US2005236270A1Controlled cooling of sputter targetsHERAEUS INC·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →