Inventor · disambiguated record
Steven Rogers
Also filed as: ROGERS STEVEN · ROGERS STEVEN H · ROGERS STEVEN HILL
6 granted patents·5 pending applications·461 citations·filing 1982–2024
87Inventor score
Files withNCR CO4WOLFSPEED INC4DELPHI TECH IP LTD1NAT FILM LAB INC DBA CREST NAT1SEAGATE TECHNOLOGY1
Top patents by PatentIndex Score
11 records- 0196US4571819AMethod for forming trench isolation structuresNCR CO·Filed 1984·Granted Feb 25, 1986·226 cites·16 claims
- 0287US4443930AManufacturing method of silicide gates and interconnects for integrated circuitsNCR CO·Filed 1982·Granted Apr 24, 1984·86 cites·16 claims
- 0381US4656497ATrench isolation structuresNCR CO·Filed 1985·Granted Apr 7, 1987·62 cites·3 claims
- 0479US5737519ASystem and method for early disc drive fault detectionSEAGATE TECHNOLOGY·Filed 1995·Granted Apr 7, 1998·43 cites·7 claims
- 0571US4630357AMethod for forming improved contacts between interconnect layers of an integrated circuitNCR CO·Filed 1985·Granted Dec 23, 1986·44 cites·11 claims
- 0656US11323126B1Dual oscillator partial-networking controller area network clock generator using a precision resistor referenceDELPHI TECH IP LTD·Filed 2021·Granted May 3, 2022·0 cites·20 claims
- 0756US2025338571A1Trench gate wide bandgap junction field effect transistors with termination regions having planar upper surfacesWOLFSPEED INC·Filed 2024·Application pending·0 cites
- 0856US2025248079A1Sic vjfet with edge termination for dual tilted gate implantsWOLFSPEED INC·Filed 2024·Application pending·0 cites
- 0952US2023420575A1Methods of forming uniformly doped deep implanted regions in silicon carbide and silicon carbide layers including uniformly doped implanted regionsWOLFSPEED INC·Filed 2022·Application pending·0 cites
- 1046US2024145537A1Semiconductor devices with additional mesa structures for reduced surface roughnessWOLFSPEED INC·Filed 2022·Application pending·0 cites
- 1130US2004179462A1Optical disc having increased storage capacityNAT FILM LAB INC DBA CREST NAT·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →