Inventor · disambiguated record
Steven P. Zuhoski
Also filed as: ZUHOSKI STEVEN P · ZUHOSKI STEVEN PAUL
8 granted patents·2 pending applications·175 citations·filing 1989–2003
89Inventor score
Top patents by PatentIndex Score
10 records- 0181US5032435AUV absorption control of thin film growthUS ENERGY·Filed 1989·Granted Jul 16, 1991·47 cites·7 claims
- 0273US5614247AApparatus for chemical vapor deposition of aluminum oxideIBM·Filed 1994·Granted Mar 25, 1997·32 cites·5 claims
- 0370US5728222AApparatus for chemical vapor deposition of aluminum oxideIBM·Filed 1995·Granted Mar 17, 1998·33 cites·10 claims
- 0469US5648113AAluminum oxide LPCVD systemIBM·Filed 1994·Granted Jul 15, 1997·25 cites·12 claims
- 0556US7309651B2Method for improving reliability of copper interconnectsTEXAS INSTRUMENTS INC·Filed 2003·Granted Dec 18, 2007·9 cites·9 claims
- 0656US5540777AAluminum oxide LPCVD systemIBM·Filed 1995·Granted Jul 30, 1996·17 cites·7 claims
- 0745US5425810ARemovable gas injectors for use in chemical vapor deposition of aluminium oxideIBM·Filed 1994·Granted Jun 20, 1995·10 cites·6 claims
- 0839US6740603B2Control of Vmin transient voltage drift by maintaining a temperature less than or equal to 350° C. after the protective overcoat levelTEXAS INSTRUMENTS INC·Filed 2002·Granted May 25, 2004·2 cites·10 claims
- 0926US2002123225A1Control of Vmin transient voltage drift by using a PECVD silicon oxynitride film at the protective overcoat levelFiled 2002·Application pending·0 cites
- 1025US2002123214A1Control of Vmin transient voltage drift by using silicon formed with deuterium-based process gasesFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →