Inventor · disambiguated record
Sungan Do
Also filed as: DO SUNGAN
0 granted patents·13 pending applications·0 citations·filing 2022–2025
Top patents by PatentIndex Score
13 records- 0171US2025123563A1Polymer, resist composition comprising the same and method of forming pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0270US2025377591A1Photoresist composition and method for fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0365US2025334882A1Resist composition and pattern formation method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0465US2025333553A1Polymer, resist composition including the same, and pattern formation method using the resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0565US2025333554A1Polymer, resist composition comprising the same and pattern formation method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0662US2025138424A1Photoreactive polymer compound, photoresist composition including the same, and method of forming pattern by using the photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0756US2023038110A1Composition for removing edge beads from metal containing resists, and method of forming patterns including step of removing edge beads using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 0856US2023037563A1Metal containing photoresist developer composition, and method of forming patterns including developing step using the sameSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 0955US2025149336A1Photoresist composition and method of manufacturing integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1054US2025164873A1Photoresist composition and method of manufacturing integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1152US2025231481A1Photoresist compositions and methods of manufacturing integrated circuit devices by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1251US2022334474A1Photoresist composition and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1349US2023176477A1Photoresist composition and method of manufacturing integrated circuit device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →