Inventor · disambiguated record
Sukkoo Hong
Also filed as: HONG SUKKOO
6 granted patents·13 pending applications·0 citations·filing 2019–2024
65Inventor score
Top patents by PatentIndex Score
19 records- 0178US11982940B2Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generatorSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted May 14, 2024·0 cites·21 claims
- 0276US12405532B2Polymer and composition for forming an anti-reflective film and method of manufacturing an integrated circuit device using the anti-reflective filmSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Sep 2, 2025·0 cites·19 claims
- 0373US2023120542A1Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 0468US11693315B2Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generatorSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jul 4, 2023·0 cites·20 claims
- 0568US11650502B2Polymer and composition for forming an anti-reflective film and method of manufacturing an integrated circuit device using the anti-reflective filmSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted May 16, 2023·0 cites·13 claims
- 0664US2022415450A1System and method for estimating solubilitySAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 0763US2021240078A1Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Application pending·0 cites
- 0863US2024239820A1Organometallic compound, resist composition including the same and pattern forming method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0963US2024337928A1Organic salt, photoresist composition including the same and method of forming pattern by using the photoresist patternSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1061US11662662B2Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 30, 2023·0 cites·14 claims
- 1156US2023038110A1Composition for removing edge beads from metal containing resists, and method of forming patterns including step of removing edge beads using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1256US2023037563A1Metal containing photoresist developer composition, and method of forming patterns including developing step using the sameSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1355US2025149336A1Photoresist composition and method of manufacturing integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1453US2022252982A1Photoresist compositions and methods of manufacturing integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Application pending·0 cites
- 1552US2024231222A1Photoresist composition and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1651US12468226B2Photoresist compositions and methods of fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Nov 11, 2025·0 cites·13 claims
- 1751US2022334474A1Photoresist composition and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1849US2022252976A1Photoresist compositions and methods of manufacturing integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1949US2023176477A1Photoresist composition and method of manufacturing integrated circuit device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →