Inventor · disambiguated record
Swapnadip Ghosh
Also filed as: GHOSH SWAPNADIP
5 granted patents·11 pending applications·15 citations·filing 2012–2023
75Inventor score
Top patents by PatentIndex Score
16 records- 0184US9269724B2Semiconductor device comprising epitaxially grown semiconductor material and an air gapHAN SANG M·Filed 2014·Granted Feb 23, 2016·6 cites·12 claims
- 0281US8937366B1Selective epitaxial overgrowth comprising air gapsHAN SANG M·Filed 2012·Granted Jan 20, 2015·5 cites·11 claims
- 0377US9530906B2Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trappingSTC UNM·Filed 2014·Granted Dec 27, 2016·2 cites·31 claims
- 0473US9941426B2Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trappingSTC UNM·Filed 2016·Granted Apr 10, 2018·1 cites·6 claims
- 0571US10483415B2Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trappingSTC UNM·Filed 2018·Granted Nov 19, 2019·1 cites·12 claims
- 0655US2025220990A1Gate cut plug with thin hermetic liner and low-k fill for reduced capacitance and oxidationINTEL CORP·Filed 2023·Application pending·0 cites
- 0750US2025159932A1Integrated circuit structures having metal gate cut plug structuresINTEL CORP·Filed 2023·Application pending·0 cites
- 0849US2025006733A1Integrated circuit structures with differential epitaxial source or drain dentINTEL CORP·Filed 2023·Application pending·0 cites
- 0949US2024213100A1Metal gate cut with hybrid material fillINTEL CORP·Filed 2022·Application pending·0 cites
- 1049US2024332088A1Modulation of chip performance by controlling transistor gate profileINTEL CORP·Filed 2023·Application pending·0 cites
- 1148US2024222447A1Gate cut, and source and drain contactsINTEL CORP·Filed 2022·Application pending·0 cites
- 1247US2024112916A1Metal gate cut formed after source and drain contactsINTEL CORP·Filed 2022·Application pending·0 cites
- 1347US2024105453A1High aspect ratio metal gate cutsINTEL CORP·Filed 2022·Application pending·0 cites
- 1446US2024213026A1Chemical mechanical polishing of metal gate cuts formed after source and drain contactsINTEL CORP·Filed 2022·Application pending·0 cites
- 1546US2024203739A1Dielectric layer stack for wide gate cut structuresINTEL CORP·Filed 2022·Application pending·0 cites
- 1645US2024113105A1Forming metal gate cuts using multiple passes for depth controlINTEL CORP·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →