Inventor · disambiguated record
Syuji Nakao
Also filed as: NAKAO SYUJI
2 granted patents·12 citations·filing 1999–2001
53Inventor score
Technology areasH10D
Files withMITSUBISHI ELECTRIC CORP2
Top patents by PatentIndex Score
2 records- 0149US6306699B1Semiconductor device having conducting material film formed in trench, manufacturing method thereof and method of forming resist pattern used thereinMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Oct 23, 2001·12 cites·15 claims
- 0232US6501118B2Semiconductor device having conducting material film formed in trench, manufacturing method thereof and method of forming resist pattern used thereinMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Dec 31, 2002·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →