Inventor · disambiguated record
Tatsuya Asaka
Also filed as: ASAKA TATSUYA
16 granted patents·349 citations·filing 1990–1995
95Inventor score
Top patents by PatentIndex Score
16 records- 0180US5181219ASurface emission type semiconductor laserSEIKO EPSON CORP·Filed 1991·Granted Jan 19, 1993·38 cites·24 claims
- 0279US5182757ASurface emission type semiconductor laserSEIKO EPSON CORP·Filed 1991·Granted Jan 26, 1993·34 cites·18 claims
- 0379US5181221ASurface emission type semiconductor laserSEIKO EPSON CORP·Filed 1991·Granted Jan 19, 1993·35 cites·20 claims
- 0473US5295148ASurface emission type semiconductor laserSEIKO EPSON CORP·Filed 1993·Granted Mar 15, 1994·33 cites·26 claims
- 0571US5317584ASurface emission type semiconductor laserSEIKO EPSON CORP·Filed 1992·Granted May 31, 1994·31 cites·40 claims
- 0667US5625637ASurface emitting semiconductor laser and its manufacturing processSEIKO EPSON CORP·Filed 1994·Granted Apr 29, 1997·23 cites·31 claims
- 0767US5621750ASurface emission type semiconductor laser, method and apparatus for producing the sameSEIKO EPSON CORP·Filed 1995·Granted Apr 15, 1997·31 cites·50 claims
- 0866US5404369ASurface emission type semiconductor laserSEIKO EPSON CORP·Filed 1994·Granted Apr 4, 1995·25 cites·43 claims
- 0956US5587335AMethod of making surface emission type semiconductor laserSEIKO EPSON CORP·Filed 1995·Granted Dec 24, 1996·18 cites·26 claims
- 1052US5145554AMethod of anisotropic dry etching of thin film semiconductorsSEIKO EPSON CORP·Filed 1990·Granted Sep 8, 1992·24 cites·29 claims
- 1150US5537666ASurface emission type semiconductor laserSEIKO EPSON COROPRATION·Filed 1994·Granted Jul 16, 1996·13 cites·11 claims
- 1250US5436922ASurface emission type semiconductor laserSEIKO EPSON CORP·Filed 1994·Granted Jul 25, 1995·13 cites·31 claims
- 1344US5375133ASurface emitting semiconductor laser and method of manufactureSEIKO EPSON CORP·Filed 1994·Granted Dec 20, 1994·9 cites·33 claims
- 1441US5356832AMethod of making surface emission type semiconductor laserSEIKO EPSON CORP·Filed 1992·Granted Oct 18, 1994·7 cites·17 claims
- 1537US5236537APlasma etching apparatusSEIKO EPSON CORP·Filed 1991·Granted Aug 17, 1993·9 cites·1 claims
- 1634US5133830AMethod of pretreatment and anisotropic dry etching of thin film semiconductorsSEIKO EPSON CORP·Filed 1990·Granted Jul 28, 1992·6 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →