Inventor · disambiguated record
Tadayuki Fujiwara
Also filed as: FUJIWARA TADAYUKI
20 granted patents·124 citations·filing 1990–2011
93Inventor score
Top patents by PatentIndex Score
20 records- 0177US6887646B1Chemical amplification resist compositionMITSUBISHI RAYON CO·Filed 2000·Granted May 3, 2005·19 cites·13 claims
- 0274US6706826B1Copolymer, process for producing the same, and resist compositionMITSUBISHI RAYON CO·Filed 1999·Granted Mar 16, 2004·37 cites·18 claims
- 0373US7316884B25-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation processMITSUBISHI RAYON CO·Filed 2002·Granted Jan 8, 2008·13 cites·44 claims
- 0462US7041838B2(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patternsMITSUBISHI RAYON CO·Filed 2001·Granted May 9, 2006·5 cites·7 claims
- 0559US8092979B2Resist polymer and resist compositionMOMOSE HIKARU·Filed 2009·Granted Jan 10, 2012·0 cites·41 claims
- 0654US8580481B2Resist polymer and resist compositionMOMOSE HIKARU·Filed 2011·Granted Nov 12, 2013·0 cites·47 claims
- 0754US7575846B2Resist polymer and resist compositionMITSUBISHI RAYON CO·Filed 2004·Granted Aug 18, 2009·2 cites·15 claims
- 0854US6927011B2Resins for resists and chemically amplifiable resist compositionsMITSUBISHI RAYON CO·Filed 2001·Granted Aug 9, 2005·3 cites·9 claims
- 0953US5878106AX-ray diffractometerSHIMADZU CORP·Filed 1996·Granted Mar 2, 1999·17 cites·6 claims
- 1046US7339014B2(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a patternMITSUBISHI RAYON CO·Filed 2004·Granted Mar 4, 2008·1 cites·13 claims
- 1144US7702486B2Apparatus and method for managing liquid crystal substrateSHIMADZU CORP·Filed 2004·Granted Apr 20, 2010·3 cites·12 claims
- 1244US5096877ARecording medium for sublimation type heat-sensitive transfer recording processMITSUBISHI RAYON CO·Filed 1990·Granted Mar 17, 1992·4 cites·6 claims
- 1343US5376500APolyester resin for a dye receptive layer of a recording medium for sublimation type heat-sensitive transfer recording process, and a recording medium using the polyester resinMITSUBISHI RAYON CO·Filed 1993·Granted Dec 27, 1994·3 cites·21 claims
- 1440US6844559B2Apparatus and method for testing substrateSHIMADZU CORP·Filed 2003·Granted Jan 18, 2005·0 cites·13 claims
- 1538US5218019ASublimation disperson dye receptive resin compositionsMITSUBISHI RAYON CO·Filed 1992·Granted Jun 8, 1993·2 cites·10 claims
- 1636US5290750ARecording media for a sublimation-type heat-sensitive recording processMITSUBISHI RAYON CO·Filed 1992·Granted Mar 1, 1994·5 cites·6 claims
- 1733US6630246B1Photocurable sheet, moldings thereof, and processes for producing the sameMITSUBISHI RAYON CO·Filed 1998·Granted Oct 7, 2003·5 cites·20 claims
- 1833US5326741ARecording medium for sublimation type heat-sensitive transfer recording processMITSUBISHI RAYON CO·Filed 1993·Granted Jul 5, 1994·4 cites·21 claims
- 1929US5326742ARecording medium for sublimation type heat-sensitive transfer recording processMITSUBISHI RAYON CO·Filed 1993·Granted Jul 5, 1994·1 cites·13 claims
- 2028US5286707ARecording medium for sublimation type heat-sensitive transfer recording processMITSUBISHI RAYON CO·Filed 1991·Granted Feb 15, 1994·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →