Inventor · disambiguated record
Tae Joong Ha
Also filed as: HA TAE JOONG
12 granted patents·7 pending applications·18 citations·filing 2007–2024
85Inventor score
Top patents by PatentIndex Score
19 records- 0184US7901844B2Method with correction of hard mask pattern critical dimension for fabricating photomaskHYNIX SEMICONDUCTOR INC·Filed 2008·Granted Mar 8, 2011·8 cites·7 claims
- 0283US12468216B2Phase shift mask for EUV lithography and manufacturing method for the phase shift maskSK HYNIX INC·Filed 2024·Granted Nov 11, 2025·0 cites·8 claims
- 0383US9454073B2Photomask blank and photomask for suppressing heat absorptionSK HYNIX INC·Filed 2014·Granted Sep 27, 2016·3 cites·23 claims
- 0475US7901849B2Photomask and method of fabricating the sameHYNIX SEMICONDUCTOR INC·Filed 2008·Granted Mar 8, 2011·4 cites·11 claims
- 0573US12025912B2Phase shift mask for EUV lithography and manufacturing method for the phase shift maskSK HYNIX INC·Filed 2021·Granted Jul 2, 2024·0 cites·14 claims
- 0666US2022121106A1Methods of fabricating phase shift photomasksSK HYNIX INC·Filed 2021·Application pending·0 cites
- 0766US2025076751A1Pellicle structureSK HYNIX INC·Filed 2024·Application pending·0 cites
- 0864US2025076750A1Pellicle membrane, pellicle assembly including the same and method of manufacturing the pellicle assemblySK HYNIX INC·Filed 2023·Application pending·0 cites
- 0960US7670728B2Method for repairing bridge in photo maskHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Mar 2, 2010·1 cites·4 claims
- 1059US7955760B2Method of correcting defect in photomaskHYNIX SEMICONDUCTOR INC·Filed 2008·Granted Jun 7, 2011·2 cites·10 claims
- 1157US10338464B2Photomask including transfer patterns for reducing a thermal stressSK HYNIX INC·Filed 2017·Granted Jul 2, 2019·0 cites·15 claims
- 1256US10036950B2Photomask blank and photomask for suppressing heat absorptionSK HYNIX INC·Filed 2016·Granted Jul 31, 2018·0 cites·12 claims
- 1356US2023111608A1Photomask including pellicleSK HYNIX INC·Filed 2022·Application pending·0 cites
- 1454US2019354004A1Blank phase shift photomasks, phase shift photomasks fabricated using blank phase shift photomasks, and methods of fabricating phase shift photomasks using blank phase shift photomasksSK HYNIX INC·Filed 2019·Application pending·0 cites
- 1553US9846358B2Photomask including transfer patterns for reducing a thermal stressSK HYNIX INC·Filed 2015·Granted Dec 19, 2017·0 cites·19 claims
- 1649US7993802B2Method for correcting pattern critical dimension in photomaskHYNIX SEMICONDUCTOR INC·Filed 2009·Granted Aug 9, 2011·0 cites·18 claims
- 1748US2022252973A1Pellicle for euv lithography and method of manufacturing the sameSK HYNIX INC·Filed 2021·Application pending·0 cites
- 1844US9612524B2Reflective mask and method of fabricating the sameSK HYNIX INC·Filed 2015·Granted Apr 4, 2017·0 cites·20 claims
- 1944US2009053620A1Blank Mask and Method for Fabricating Photomask Using the SameHYNIX SEMICONDUCTOR INC·Filed 2007·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Tae Joong Ha files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →