Inventor · disambiguated record
Takeshi Hioki
Also filed as: HIOKI TAKESHI
20 granted patents·129 citations·filing 1987–2002
94Inventor score
Files withSUMITOMO CHEMICAL CO20
Top patents by PatentIndex Score
20 records- 0169US5218136AStyryl compounds, process for preparing the same and photoresist compositions comprising the sameSUMITOMO CHEMICAL CO·Filed 1988·Granted Jun 8, 1993·9 cites·27 claims
- 0267US5792585ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Aug 11, 1998·7 cites·6 claims
- 0362US5456995ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Oct 10, 1995·14 cites·8 claims
- 0459US5080997AProcess for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixtureSUMITOMO CHEMICAL CO·Filed 1989·Granted Jan 14, 1992·13 cites·22 claims
- 0559US5061796AAzamethine compoundsSUMITOMO CHEMICAL CO·Filed 1989·Granted Oct 29, 1991·4 cites·6 claims
- 0656US5456996ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Oct 10, 1995·12 cites·7 claims
- 0754US5077264ACyan dye-donor element used in thermal transfer and thermal transfer sheet using itSUMITOMO CHEMICAL CO·Filed 1989·Granted Dec 31, 1991·7 cites·23 claims
- 0853US5028708AAzamethinyl quinoline derivativesSUMITOMO CHEMICAL CO·Filed 1988·Granted Jul 2, 1991·3 cites·18 claims
- 0951US5188920APositive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compoundSUMITOMO CHEMICAL CO·Filed 1991·Granted Feb 23, 1993·10 cites·10 claims
- 1050US7264912B2Method of producing photoresistSUMITOMO CHEMICAL CO·Filed 2002·Granted Sep 4, 2007·4 cites·3 claims
- 1149US5736292ARadiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groupsSUMITOMO CHEMICAL CO·Filed 1995·Granted Apr 7, 1998·9 cites·1 claims
- 1247US5403696ARadiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenolSUMITOMO CHEMICAL CO·Filed 1993·Granted Apr 4, 1995·7 cites·16 claims
- 1347US5220027ASulfone-containing azamethide compounds with a nitrogen-containing aromatic ring of nitrogen containing aliphaticSUMITOMO CHEMICAL CO·Filed 1991·Granted Jun 15, 1993·3 cites·3 claims
- 1445US5861229ARadiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compoundSUMITOMO CHEMICAL CO·Filed 1992·Granted Jan 19, 1999·7 cites·3 claims
- 1545US5407780ARadiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehydeSUMITOMO CHEMICAL CO·Filed 1994·Granted Apr 18, 1995·8 cites·21 claims
- 1643US5198323AResist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation componentSUMITOMO CHEMICAL CO·Filed 1991·Granted Mar 30, 1993·7 cites·13 claims
- 1742US5136054ASulfone-containing azamethine compoundsSUMITOMO CHEMICAL CO·Filed 1990·Granted Aug 4, 1992·2 cites·3 claims
- 1832US5354644APhotoresist compositions comprising styryl compoundSUMITOMO CHEMICAL CO·Filed 1992·Granted Oct 11, 1994·2 cites·5 claims
- 1931US5783355ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1995·Granted Jul 21, 1998·1 cites·11 claims
- 2019US4769494AProcess for producing O,O-di-lower-alkylchlorothiophosphateSUMITOMO CHEMICAL CO·Filed 1987·Granted Sep 6, 1988·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →