Inventor · disambiguated record
Tadashi Ikejiri
Also filed as: IKEJIRI TADASHI
10 granted patents·69 citations·filing 2001–2010
87Inventor score
Files withNISSIN ION EQUIPMENT CO LTD6IGO TETSUYA1IKEJIRI TADASHI1NISSIN ELECTRIC CO LTD1YAMASHITA TAKATOSHI1
Top patents by PatentIndex Score
10 records- 0190US7635850B2Ion implanterNISSIN ION EQUIPMENT CO LTD·Filed 2007·Granted Dec 22, 2009·18 cites·20 claims
- 0284US8702920B2Repeller structure and ion sourceIKEJIRI TADASHI·Filed 2010·Granted Apr 22, 2014·12 cites·5 claims
- 0382US7791041B2Ion source, ion implantation apparatus, and ion implantation methodNISSIN ION EQUIPMENT CO LTD·Filed 2008·Granted Sep 7, 2010·9 cites·20 claims
- 0480US8253114B2Ion sourceYAMASHITA TAKATOSHI·Filed 2009·Granted Aug 28, 2012·9 cites·14 claims
- 0579US8389964B2Ion implanting apparatus and deflecting electrodeIGO TETSUYA·Filed 2009·Granted Mar 5, 2013·8 cites·4 claims
- 0674US7755062B2Ion source and ion implantation apparatusNISSIN ION EQUIPMENT CO LTD·Filed 2009·Granted Jul 13, 2010·3 cites·7 claims
- 0768US7772573B2Ion implanting apparatus and method of correcting beam orbitNISSIN ION EQUIPMENT CO LTD·Filed 2009·Granted Aug 10, 2010·2 cites·8 claims
- 0862US7655929B2Ion beam measuring method and ion implanting apparatusNISSIN ION EQUIPMENT CO LTD·Filed 2006·Granted Feb 2, 2010·2 cites·26 claims
- 0957US6651582B2Method and device for irradiating an ion beam, and related method and device thereofNISSIN ELECTRIC CO LTD·Filed 2001·Granted Nov 25, 2003·6 cites·3 claims
- 1043US7541601B2Ion beam irradiating apparatus and method of adjusting uniformity of a beamNISSIN ION EQUIPMENT CO LTD·Filed 2006·Granted Jun 2, 2009·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →