Inventor · disambiguated record
Tadahiro Imada
Also filed as: IMADA TADAHIRO
45 granted patents·20 pending applications·105 citations·filing 2006–2018
97Inventor score
Top patents by PatentIndex Score
65 records- 0194US10301989B2Microwave applicator, exhaust gas purifier, heater, and chemical reactorFUJITSU LTD·Filed 2016·Granted May 28, 2019·14 cites·10 claims
- 0292US8198653B2Compound semiconductor device and manufacturing method of the sameIMADA TADAHIRO·Filed 2009·Granted Jun 12, 2012·18 cites·9 claims
- 0391US9099351B2Compound semiconductor device and method of manufacturing the sameTRANSPHORM JAPAN INC·Filed 2013·Granted Aug 4, 2015·13 cites·7 claims
- 0488US10576406B2Exhaust purification device, internal combustion device, and power generation deviceFUJITSU LTD·Filed 2018·Granted Mar 3, 2020·3 cites·13 claims
- 0587US8872232B2Compound semiconductor device and method for manufacturing the sameIMADA TADAHIRO·Filed 2011·Granted Oct 28, 2014·9 cites·16 claims
- 0686US8765554B2Compound semiconductor device and method for manufacturing the sameIMADA TADAHIRO·Filed 2011·Granted Jul 1, 2014·8 cites·18 claims
- 0784US9312373B2Compound semiconductor device and manufacturing method of the sameFUJITSU LTD·Filed 2013·Granted Apr 12, 2016·6 cites·12 claims
- 0881US10577992B2Microwave heating apparatus and exhaust gas purification apparatusFUJITSU LTD·Filed 2017·Granted Mar 3, 2020·3 cites·19 claims
- 0978US9608083B2Semiconductor deviceFUJITSU LTD·Filed 2015·Granted Mar 28, 2017·2 cites·10 claims
- 1077US8431464B2Process for producing silicic coating, silicic coating and semiconductor deviceKOBAYASHI YASUSHI·Filed 2010·Granted Apr 30, 2013·2 cites·19 claims
- 1177US8404584B2Method of manufacturing semiconductor deviceIMADA TADAHIRO·Filed 2011·Granted Mar 26, 2013·4 cites·13 claims
- 1276US10876458B2Microwave irradiation device, exhaust purification apparatus, automobile and management systemFUJITSU LTD·Filed 2018·Granted Dec 29, 2020·1 cites·12 claims
- 1375US10603617B2Microwave irradiation apparatus and exhaust gas purification apparatusFUJITSU LTD·Filed 2016·Granted Mar 31, 2020·2 cites·2 claims
- 1474US10270406B2Power amplifier, semiconductor integrated circuit, and method of controlling the power amplifierFUJITSU LTD·Filed 2017·Granted Apr 23, 2019·2 cites·5 claims
- 1574US9547320B2Power supply circuit and power supply apparatusFUJITSU LTD·Filed 2013·Granted Jan 17, 2017·2 cites·5 claims
- 1673US8164166B2Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor deviceIMADA TADAHIRO·Filed 2008·Granted Apr 24, 2012·4 cites·16 claims
- 1772US9166030B2Compound semiconductor device and method for fabricatingIMADA TADAHIRO·Filed 2012·Granted Oct 20, 2015·2 cites·7 claims
- 1870US9077336B2Transistor control circuit and power supply deviceFUJITSU LTD·Filed 2013·Granted Jul 7, 2015·2 cites·5 claims
- 1969US8449787B2Method for wet etching while forming interconnect trench in insulating filmIMADA TADAHIRO·Filed 2008·Granted May 28, 2013·2 cites·7 claims
- 2068US7830013B2Material for forming adhesion reinforcing layer, adhesion reinforcing layer, semiconductor device, and manufacturing method thereofFUJITSU LTD·Filed 2006·Granted Nov 9, 2010·1 cites·13 claims
- 2166US8716209B2Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor deviceKOBAYASHI YASUSHI·Filed 2009·Granted May 6, 2014·2 cites·28 claims
- 2264US8716748B2Semiconductor device and method of manufacturing the same, and power supply apparatusIMADA TADAHIRO·Filed 2011·Granted May 6, 2014·2 cites·20 claims
- 2362US7470975B2Composition for forming insulation film, insulation film for semiconductor device, and fabrication method and semiconductor device thereofFUJITSU LTD·Filed 2006·Granted Dec 30, 2008·0 cites·20 claims
- 2460US10626777B2Exhaust purification device and vehicleFUJITSU LTD·Filed 2017·Granted Apr 21, 2020·0 cites·6 claims
- 2559US10221739B2Particulate filter and exhaust gas purifierFUJITSU LTD·Filed 2016·Granted Mar 5, 2019·0 cites·11 claims
- 2658US8492784B2Semiconductor device and method for producing the same, and power supplyOKAMOTO KEISHIRO·Filed 2011·Granted Jul 23, 2013·1 cites·20 claims
- 2755US10526944B2Filter regeneration device, filter plugging detection device, exhaust gas treatment apparatus, and filter plugging determination methodFUJITSU LTD·Filed 2017·Granted Jan 7, 2020·0 cites·12 claims
- 2855US9082756B2Semiconductor device and power source deviceFUJITSU LTD·Filed 2014·Granted Jul 14, 2015·0 cites·8 claims
- 2952US10850221B2Fine particle detector and exhaust gas purification apparatusFUJITSU LTD·Filed 2017·Granted Dec 1, 2020·0 cites·15 claims
- 3052US2013233489A1Apparatus for wet etching while forming interconnect trench in insulating filmFUJITSU LTD·Filed 2013·Application pending·0 cites
- 3151US10108263B2Input apparatus including input cancelling circuitFUJITSU LTD·Filed 2016·Granted Oct 23, 2018·0 cites·4 claims
- 3251US9190507B2Semiconductor deviceFUJITSU LTD·Filed 2012·Granted Nov 17, 2015·0 cites·13 claims
- 3351US8735942B2Compound semiconductor device and manufacturing method of the sameIMADA TADAHIRO·Filed 2012·Granted May 27, 2014·0 cites·9 claims
- 3450US10453948B2Semiconductor device which comprises transistor and diodeFUJITSU LTD·Filed 2015·Granted Oct 22, 2019·0 cites·4 claims
- 3550US9515063B2Compound semiconductor device and manufacturing method of the sameFUJITSU LTD·Filed 2016·Granted Dec 6, 2016·0 cites·8 claims
- 3649US9647527B2Power supply circuit and power factor correction circuitFUJITSU LTD·Filed 2015·Granted May 9, 2017·0 cites·5 claims
- 3749US9564527B2Semiconductor device and manufacturing method of semiconductor deviceFUJITSU LTD·Filed 2013·Granted Feb 7, 2017·0 cites·8 claims
- 3849US9337326B2Compound semiconductor device and method for fabricating the sameFUJITSU LTD·Filed 2015·Granted May 10, 2016·0 cites·10 claims
- 3948US8941093B2Compound semiconductor device and manufacturing method thereofFUJITSU LTD·Filed 2013·Granted Jan 27, 2015·0 cites·7 claims
- 4048US8089138B2Surface-hydrophobicized film, material for formation of surface-hydrophobicized film, wiring layer, semiconductor device and process for producing semiconductor deviceIMADA TADAHIRO·Filed 2009·Granted Jan 3, 2012·0 cites·8 claims
- 4148US2012091522A1Semiconductor device and manufacturing method thereofOZAKI SHIROU·Filed 2011·Application pending·0 cites
- 4248US2017104098A1Semiconductor deviceFUJITSU LTD·Filed 2016·Application pending·0 cites
- 4347US7928536B2Roughness reducing film at interface, materials for forming roughness reducing film at interface, wiring layer and semiconductor device using the same, and method for manufacturing semiconductor deviceFUJITSU LTD·Filed 2007·Granted Apr 19, 2011·0 cites·4 claims
- 4445US2009061633A1Method of manufacturing semiconductor deviceFUJITSU LTD·Filed 2008·Application pending·0 cites
- 4545US2008057717A1Semiconductor device manufacturing methodFUJITSU LTD·Filed 2007·Application pending·0 cites
- 4645US2018258809A1Exhaust purification apparatus, automobile, and management systemFUJITSU LTD·Filed 2018·Application pending·0 cites
- 4744US8941116B2Semiconductor device and method of manufacturing the sameIMADA TADAHIRO·Filed 2011·Granted Jan 27, 2015·0 cites·12 claims
- 4844US2018339256A1Antenna, covering member, and exhaust purification deviceFUJITSU LTD·Filed 2018·Application pending·0 cites
- 4943US9240472B2Semiconductor device, PFC circuit, power supply device, and amplifierFUJITSU LTD·Filed 2013·Granted Jan 19, 2016·0 cites·15 claims
- 5043US8390099B2Interconnection substrate having first and second insulating films with an adhesion enhancing layer therebetweenOZAKI SHIROU·Filed 2010·Granted Mar 5, 2013·0 cites·10 claims
Showing the top 50 of 65 patent records by PatentIndex Score.
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