Inventor · disambiguated record
Takao Iwayanagi
Also filed as: IWAYANAGI TAKAO
13 granted patents·464 citations·filing 1981–1999
93Inventor score
Top patents by PatentIndex Score
13 records- 0196US5554911ALight-emitting elementsHITACHI LTD·Filed 1994·Granted Sep 10, 1996·208 cites·27 claims
- 0281US4536421AMethod of forming a microscopic patternHITACHI LTD·Filed 1981·Granted Aug 20, 1985·37 cites·17 claims
- 0379US6475680B1Lithium secondary battery, its electrolyte, and electric apparatus using the sameHITACHI LTD·Filed 1999·Granted Nov 5, 2002·63 cites·7 claims
- 0474US5061599ARadiation sensitive materialsHITACHI LTD·Filed 1990·Granted Oct 29, 1991·26 cites·6 claims
- 0571US4436583ASelective etching method of polyimide type resin filmHITACHI LTD·Filed 1982·Granted Mar 13, 1984·32 cites·8 claims
- 0670US4835089AResist pattern forming process with dry etchingHITACHI LTD·Filed 1987·Granted May 30, 1989·22 cites·34 claims
- 0761US4985344ARadiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayerHITACHI LTD·Filed 1989·Granted Jan 15, 1991·14 cites·20 claims
- 0861US4465768APattern-formation method with iodine containing azide and oxygen plasma etching of substrateHITACHI LTD·Filed 1982·Granted Aug 14, 1984·15 cites·19 claims
- 0960US4614706AMethod of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etchingHITACHI LTD·Filed 1984·Granted Sep 30, 1986·16 cites·31 claims
- 1056US4469778APattern formation method utilizing deep UV radiation and bisazide compositionHITACHI LTD·Filed 1983·Granted Sep 4, 1984·13 cites·24 claims
- 1146US4728594APhotosensitive composition with azide or bisazide compound with oxazolone groupHITACHI CHEMICAL CO LTD·Filed 1986·Granted Mar 1, 1988·11 cites·6 claims
- 1240US4719161AMask for X-ray lithography and process for producing the sameHITACHI LTD·Filed 1986·Granted Jan 12, 1988·7 cites·6 claims
- 1325US4983500ARadiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayerHITACHI LTD·Filed 1988·Granted Jan 8, 1991·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →