Inventor · disambiguated record
Takakazu Kage
Also filed as: KAGE TAKAKAZU
7 granted patents·3 pending applications·5 citations·filing 2011–2017
74Inventor score
Top patents by PatentIndex Score
10 records- 0178US9550723B2Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material compositionDAINIPPON INK & CHEMICALS·Filed 2016·Granted Jan 24, 2017·1 cites·12 claims
- 0269US8846297B2Positive photoresist composition, coating film thereof, and novolac phenol resinIMADA TOMOYUKI·Filed 2012·Granted Sep 30, 2014·2 cites·20 claims
- 0369US8623585B2Positive-type photoresist compositionIMADA TOMOYUKI·Filed 2011·Granted Jan 7, 2014·2 cites·8 claims
- 0459US9469592B2Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material compositionDAINIPPON INK & CHEMICALS·Filed 2013·Granted Oct 18, 2016·0 cites·20 claims
- 0556US2018105632A1Alkoxylated resol-type phenol resin manufacturing method, alkoxylated resol-type phenol resin, resin composition, and coatingDAINIPPON INK & CHEMICALS·Filed 2017·Application pending·0 cites
- 0649US8816033B2Radically curable compound, cured product thereof, and method for producing the compoundIMADA TOMOYUKI·Filed 2012·Granted Aug 26, 2014·0 cites·10 claims
- 0748US2017029550A1Alkoxylated resol-type phenol resin manufacturing method, alkoxylated resol-type phenol resin, resin composition, and coatingDAINIPPON INK & CHEMICALS·Filed 2015·Application pending·0 cites
- 0848US2016017083A1Modified novolac phenol resin, resist material, coating film, and resist permanent filmDAINIPPON INK & CHEMICALS·Filed 2014·Application pending·0 cites
- 0946US9481631B2Phenolic hydroxyl group-containing compound, phenolic hydroxyl group-containing composition, (meth)acryloyl group-containing resin, curable composition, cured product thereof, and resist materialDAINIPPON INK & CHEMICALS·Filed 2013·Granted Nov 1, 2016·0 cites·9 claims
- 1044US8632946B2Positive-type photoresist compositionKAGE TAKAKAZU·Filed 2011·Granted Jan 21, 2014·0 cites·16 claims
Join the waitlist — get patent alerts
Get an alert when Takakazu Kage files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →