Inventor · disambiguated record
Takashi Kamikubo
Also filed as: KAMIKUBO TAKASHI
20 granted patents·3 pending applications·300 citations·filing 1995–2019
94Inventor score
Top patents by PatentIndex Score
23 records- 0193US5863682ACharged particle beam writing method for determining optimal exposure dose prior to pattern drawingTOSHIBA KK·Filed 1997·Granted Jan 26, 1999·107 cites·20 claims
- 0288US8207514B2Charged particle beam drawing apparatus and proximity effect correction method thereofHARA SHIGEHIRO·Filed 2010·Granted Jun 26, 2012·15 cites·10 claims
- 0386US10699877B2Charged-particle beam writing apparatus and charged-particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2019·Granted Jun 30, 2020·3 cites·14 claims
- 0486US6313476B1Charged beam lithography systemTOSHIBA KK·Filed 1999·Granted Nov 6, 2001·56 cites·12 claims
- 0584US7679068B2Method of calculating deflection aberration correcting voltage and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Mar 16, 2010·8 cites·14 claims
- 0682US8835881B2Drift correction method and pattern writing data generation methodNUFLARE TECHNOLOGY INC·Filed 2013·Granted Sep 16, 2014·5 cites·18 claims
- 0782US7705322B2Charged-particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2008·Granted Apr 27, 2010·6 cites·9 claims
- 0881US8183544B2Correcting substrate for charged particle beam lithography apparatusTSURUTA KAORU·Filed 2009·Granted May 22, 2012·10 cites·8 claims
- 0976US7495243B2Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording mediumNUFLARE TECHNOLOGY INC·Filed 2007·Granted Feb 24, 2009·6 cites·10 claims
- 1076US5854323APigment dispersing agent, composition containing the same, and aqueous pigment dispersionTOYO INK MFG CO·Filed 1996·Granted Dec 29, 1998·19 cites·11 claims
- 1175US9343323B2Method of producing aperture memberNUFLARE TECHNOLOGY INC·Filed 2015·Granted May 17, 2016·2 cites·17 claims
- 1275US6346354B1Pattern writing methodTOSHIBA KK·Filed 2000·Granted Feb 12, 2002·12 cites·10 claims
- 1372US6123763APigment dispersing agent and pigment composition containing the sameTOYO INK MFG CO·Filed 1999·Granted Sep 26, 2000·38 cites·4 claims
- 1464US8859997B2Charged particle beam writing apparatus and charged particle beam writing methodKAMIKUBO TAKASHI·Filed 2012·Granted Oct 14, 2014·2 cites·10 claims
- 1563US7083674B1Pigment dispersant, and pigment composition, pigment dispersion and printing ink using the sameTOYO INK MFG CO·Filed 2005·Granted Aug 1, 2006·1 cites·6 claims
- 1650US2008265174A1Charged particle beam writing apparatus and methodNUFLARE TECHNOLOGY INC·Filed 2008·Application pending·0 cites
- 1747US8367276B2Mask blank and method of manufacturing maskHOYA CORP·Filed 2008·Granted Feb 5, 2013·0 cites·15 claims
- 1845US9159535B2Multi charged particle beam writing method, and multi charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2014·Granted Oct 13, 2015·0 cites·17 claims
- 1942US2007243487A1Forming method of resist pattern and writing method of charged particle beamNUFLARE TECHNOLOGY INC·Filed 2007·Application pending·0 cites
- 2041US5698618ACoating compositionTOYO INK MFG CO·Filed 1995·Granted Dec 16, 1997·10 cites·16 claims
- 2139US8301291B2Charged particle beam writing apparatus, write data creation method and charged particle beam writing methodKAMIKUBO TAKASHI·Filed 2011·Granted Oct 30, 2012·0 cites·10 claims
- 2237US7077899B2Pigment dispersing agent, pigment composition containing the same and pigment dispersion containing the sameTOYO INK MFG CO·Filed 2004·Granted Jul 18, 2006·0 cites·3 claims
- 2336US2010178611A1Lithography method of electron beamNUFLARE TECHNOLOGY INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →