Inventor · disambiguated record
Takehiko Kezuka
Also filed as: KEZUKA TAKEHIKO
9 granted patents·6 pending applications·131 citations·filing 1995–2025
89Inventor score
Top patents by PatentIndex Score
15 records- 0188US6831048B2Detergent compositionDAIKIN IND LTD·Filed 2001·Granted Dec 14, 2004·40 cites·18 claims
- 0273US7833957B2Removing solutionDAIKIN IND LTD·Filed 2003·Granted Nov 16, 2010·11 cites·41 claims
- 0369US6159865AWafer treating solution and method for preparing the sameDAIKIN IND LTD·Filed 2000·Granted Dec 12, 2000·12 cites·14 claims
- 0468US8822396B2Solution for removing residue after semiconductor dry process and method of removing the residue using the sameNAKAMURA SHINGO·Filed 2008·Granted Sep 2, 2014·3 cites·16 claims
- 0563US6068788AWafer-cleaning solution and process for the production thereofDAIKIN IND LTD·Filed 1996·Granted May 30, 2000·25 cites·1 claims
- 0660US9399734B2Etching solutionITANO MITSUSHI·Filed 2008·Granted Jul 26, 2016·2 cites·6 claims
- 0754US2025323054A1Semiconductor device manufacturing method including plasma etching processSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0853US7052627B1Etching solution, etched article and method for etched articleDAIKIN IND LTD·Filed 1999·Granted May 30, 2006·16 cites·13 claims
- 0946US2005224459A1Etching solution, etched article and method for etched articleKEZUKA TAKEHIKO·Filed 2005·Application pending·0 cites
- 1045US5763375ACleaning agents and cleaning methodDAIKIN IND LTD·Filed 1995·Granted Jun 9, 1998·12 cites·16 claims
- 1143US7404910B1Etching solution, etched article and method for etched articleDAIKIN IND LTD·Filed 1999·Granted Jul 29, 2008·10 cites·8 claims
- 1243US2005054549A1Detergent compositionDAIKIN IND LTD·Filed 2004·Application pending·0 cites
- 1343US2005003977A1Composition for cleaningFiled 2002·Application pending·0 cites
- 1441US2006091355A1Solution and method for removing ashing residue in Cu/low-k multilevel interconnection structureDAIKIN IND LTD·Filed 2005·Application pending·0 cites
- 1532US2006178282A1Process for production of etching or cleaning fluidsSUYAMA MAKOTO·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →