Inventor · disambiguated record
Tadahiro Kimura
Also filed as: KIMURA TADAHIRO
13 granted patents·10 pending applications·123 citations·filing 1997–2019
89Inventor score
Top patents by PatentIndex Score
23 records- 0196US11009130B2Sliding componentEAGLE IND CO LTD·Filed 2017·Granted May 18, 2021·22 cites·4 claims
- 0290US11739844B2Mechanical sealEAGLE IND CO LTD·Filed 2017·Granted Aug 29, 2023·6 cites·3 claims
- 0383US9982177B2Slurry, polishing fluid set, polishing fluid, and substrate polishing method using sameIWANO TOMOHIRO·Filed 2011·Granted May 29, 2018·6 cites·25 claims
- 0475US5929458ARadiation shieldHITACHI LTD·Filed 1997·Granted Jul 27, 1999·68 cites·5 claims
- 0559US8778217B2Polishing slurry for CMP, and polishing methodKIMURA TADAHIRO·Filed 2007·Granted Jul 15, 2014·2 cites·18 claims
- 0658US6810189B2Optical waveguide and method for preparing the sameHITACHI LTD·Filed 2002·Granted Oct 26, 2004·6 cites·18 claims
- 0756US10703947B2Slurry, polishing fluid set, polishing fluid, and substrate polishing method using sameHITACHI CHEMICAL CO LTD·Filed 2018·Granted Jul 7, 2020·0 cites·6 claims
- 0853US11402023B2Mechanical sealEAGLE IND CO LTD·Filed 2019·Granted Aug 2, 2022·0 cites·20 claims
- 0953US2014065825A1Polishing slurry for cmp and polishing methodHITACHI CHEMICAL CO LTD·Filed 2013·Application pending·0 cites
- 1052US11549589B2Mechanical sealEAGLE IND CO LTD·Filed 2019·Granted Jan 10, 2023·0 cites·4 claims
- 1151US2007117394A1Polishing slurry for CMP and polishing methodHITACHI CHEMICAL CO LTD·Filed 2006·Application pending·0 cites
- 1248US2017267895A9Polishing slurry for cmp and polishing methodHITACHI CHEMICAL CO LTD·Filed 2015·Application pending·0 cites
- 1345US11221074B2Mechanical sealEAGLE IND CO LTD·Filed 2018·Granted Jan 11, 2022·0 cites·14 claims
- 1444US2021048107A1Sealing apparatusEAGLE IND CO LTD·Filed 2019·Application pending·0 cites
- 1544US2009283715A1Polishing slurry for cmpNOBE SHIGERU·Filed 2007·Application pending·0 cites
- 1644US2017139325A1Photosensitive refractive index-adjusting transfer filmHITACHI CHEMICAL CO LTD·Filed 2014·Application pending·0 cites
- 1743US5859438ARadiation shielding bodyHITACHI LTD·Filed 1997·Granted Jan 12, 1999·13 cites·19 claims
- 1843US2018284920A1Transfer-type photosensitive film for refractive-index modulationHITACHI CHEMICAL CO LTD·Filed 2015·Application pending·0 cites
- 1942US2010015806A1Cmp polishing slurry, additive liquid for cmp polishing slurry, and substrate-polishing processes using the sameFUKASAWA MASATO·Filed 2007·Application pending·0 cites
- 2036US9162316B2Electron beam welding methodNARITA RYUICHI·Filed 2011·Granted Oct 20, 2015·0 cites·4 claims
- 2135US2018074405A1Transfer-type photosensitive refractive index adjustment film, method for forming refractive index adjustment pattern, and electronic componentHITACHI CHEMICAL CO LTD·Filed 2015·Application pending·0 cites
- 2233US2018107112A1Transfer-type photosensitive refractive index adjustment film, method for forming refractive index adjustment pattern, and electronic componentHITACHI CHEMICAL CO LTD·Filed 2015·Application pending·0 cites
- 2330US9022834B2Polishing solution for CMP and polishing method using the polishing solutionSATOU EIICHI·Filed 2011·Granted May 5, 2015·0 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →