Inventor · disambiguated record
Takahiro Kishioka
Also filed as: KISHIOKA TAKAHIRO
64 granted patents·25 pending applications·137 citations·filing 2002–2025
98Inventor score
Files withNISSAN CHEMICAL CORP36NISSAN CHEMICAL IND LTD32KISHIOKA TAKAHIRO6MAEDA SHINICHI3UMEZAKI MAKIKO2
Top patents by PatentIndex Score
89 records- 0189US7790356B2Condensation type polymer-containing anti-reflective coating for semiconductorNISSAN CHEMICAL IND LTD·Filed 2005·Granted Sep 7, 2010·9 cites·16 claims
- 0288US10804111B2Method for roughening surface using wet treatmentNISSAN CHEMICAL IND LTD·Filed 2016·Granted Oct 13, 2020·5 cites·16 claims
- 0388US7595144B2Sulfonate-containing anti-reflective coating forming composition for lithographyNISSAN CHEMICAL IND LTD·Filed 2005·Granted Sep 29, 2009·7 cites·12 claims
- 0486US7816067B2Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivativeNISSAN CHEMICAL IND LTD·Filed 2006·Granted Oct 19, 2010·8 cites·12 claims
- 0582US9214345B2Film-forming composition and ion implantation methodNISSAN CHEMICAL IND LTD·Filed 2013·Granted Dec 15, 2015·5 cites·9 claims
- 0681US10774234B2Cell culture vesselNISSAN CHEMICAL IND LTD·Filed 2014·Granted Sep 15, 2020·3 cites·24 claims
- 0779US7846638B2Composition for forming anti-reflective coating for use in lithographyNISSAN CHEMICAL IND LTD·Filed 2007·Granted Dec 7, 2010·5 cites·12 claims
- 0879US7842620B2Method for manufacturing semiconductor device using quadruple-layer laminateNISSAN CHEMICAL IND LTD·Filed 2007·Granted Nov 30, 2010·6 cites·10 claims
- 0978US10437151B2Cationically polymerizable resist underlayer film-forming compositionNISSAN CHEMICAL IND LTD·Filed 2016·Granted Oct 8, 2019·1 cites·9 claims
- 1076US7425403B2Composition for forming anti-reflective coating for use in lithographyNISSAN CHEMICAL IND LTD·Filed 2006·Granted Sep 16, 2008·4 cites·6 claims
- 1175US8445175B2Composition containing hydroxylated condensation resin for forming resist underlayer filmHIROI YOSHIOMI·Filed 2007·Granted May 21, 2013·4 cites·8 claims
- 1274US12331156B2Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymerNISSAN CHEMICAL CORP·Filed 2024·Granted Jun 17, 2025·0 cites·15 claims
- 1374US11460771B2Protective film forming composition having an acetal structureNISSAN CHEMICAL CORP·Filed 2018·Granted Oct 4, 2022·1 cites·12 claims
- 1474US11112696B2Protective film-forming compositionNISSAN CHEMICAL CORP·Filed 2017·Granted Sep 7, 2021·2 cites·10 claims
- 1573US7425399B2Composition for forming anti-reflective coating for use in lithographyNISSAN CHEMICAL IND LTD·Filed 2003·Granted Sep 16, 2008·13 cites·1 claims
- 1672US12332566B2Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2019·Granted Jun 17, 2025·0 cites·10 claims
- 1772US9023583B2Monolayer or multilayer forming compositionKISHIOKA TAKAHIRO·Filed 2011·Granted May 5, 2015·2 cites·7 claims
- 1872US2025199409A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2025·Application pending·0 cites
- 1971US10222697B2Photosensitive fiber and method for manufacturing sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Mar 5, 2019·1 cites·13 claims
- 2071US7332266B2Composition for forming anti-reflective coating for use in lithographyNISSAN CHEMICAL IND LTD·Filed 2002·Granted Feb 19, 2008·12 cites·6 claims
- 2170US8685615B2Photosensitive resist underlayer film forming compositionKIMURA SHIGEO·Filed 2010·Granted Apr 1, 2014·2 cites·12 claims
- 2270US2025270359A1Composition for forming resist underlayer filmNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 2369US2025215256A1Polymer film-forming composition and selective polymer film-forming methodNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 2468US9678427B2Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chainNISSAN CHEMICAL IND LTD·Filed 2014·Granted Jun 13, 2017·1 cites·6 claims
- 2568US7794919B2Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compoundNISSAN CHEMICAL IND LTD·Filed 2004·Granted Sep 14, 2010·7 cites·8 claims
- 2667US11003078B2Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation methodNISSAN CHEMICAL CORP·Filed 2017·Granted May 11, 2021·1 cites·10 claims
- 2767US7501229B2Anti-reflective coating containing sulfur atomNISSAN CHEMICAL IND LTD·Filed 2005·Granted Mar 10, 2009·2 cites·4 claims
- 2865US11542366B2Composition for forming resist underlayer film and method for forming resist pattern using sameNISSAN CHEMICAL IND LTD·Filed 2020·Granted Jan 3, 2023·0 cites·3 claims
- 2964US12339586B2Photocurable resin composition containing self-crosslinkable polymerNISSAN CHEMICAL CORP·Filed 2023·Granted Jun 24, 2025·0 cites·12 claims
- 3063US9436085B2Composition for forming photosensitive resist underlayer filmHORIGUCHI YUSUKE·Filed 2010·Granted Sep 6, 2016·1 cites·2 claims
- 3162US11345827B2Ion complex material having function of inhibiting adhesion of biological substance and method for manufacturing the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted May 31, 2022·0 cites·13 claims
- 3262US10092687B2Blood filter and method for manufacturing the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Oct 9, 2018·2 cites·12 claims
- 3362US8436339B2Gate insulating film forming agent for thin-film transistorMAEDA SHINICHI·Filed 2008·Granted May 7, 2013·1 cites·9 claims
- 3461US11965059B2Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymerNISSAN CHEMICAL CORP·Filed 2020·Granted Apr 23, 2024·0 cites·14 claims
- 3561US8007979B2Acrylic polymer-containing gap fill material forming composition for lithographyNISSAN CHEMICAL IND LTD·Filed 2004·Granted Aug 30, 2011·6 cites·6 claims
- 3661US2025172869A1Wafer end protective-film forming composition for semiconductor manufacturingNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 3760US7226721B2Underlayer coating forming composition for lithography containing compound having protected carboxyl groupNISSAN CHEMICAL IND LTD·Filed 2004·Granted Jun 5, 2007·15 cites·15 claims
- 3860US6927266B2Bottom anti-reflective coat forming composition for lithographyNISSAN CHEMICAL IND LTD·Filed 2002·Granted Aug 9, 2005·6 cites·6 claims
- 3960US2025180993A1Resist underlayer film-forming composition for reducing environmental loadNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 4056US7326509B2Composition for forming anti-reflective coating for use in lithographyNISSAN CHEMICAL IND LTD·Filed 2002·Granted Feb 5, 2008·4 cites·9 claims
- 4155US9957644B2Fiber-forming composition and bio-compatible material using said fiberNISSAN CHEMICAL IND LTD·Filed 2014·Granted May 1, 2018·0 cites·5 claims
- 4255US2025361419A1Composition for forming coating film for removing foreign matters and semiconductor substrateNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 4354US10684546B2Composition for forming resist underlayer filmNISSAN CHEMICAL CORP·Filed 2017·Granted Jun 16, 2020·0 cites·8 claims
- 4454US2024393693A1Silicon-containing resist underlayer film forming composition, laminate using the composition, and method for manufacturing semiconductor elementNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4553US10202528B2Polymer and composition including same, and adhesive compositionNISSAN CHEMICAL IND LTD·Filed 2016·Granted Feb 12, 2019·0 cites·6 claims
- 4653US2024219834A1Method for forming a resist patternNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4753US2025065601A1Laminate, release agent composition, and method for producing processed semiconductor substrateNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4853US2025014901A1Wafer edge protective film-forming composition for semiconductor manufacturingNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 4952US8460855B2Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compoundKISHIOKA TAKAHIRO·Filed 2010·Granted Jun 11, 2013·0 cites·2 claims
- 5052US2025011507A1Polycyclic aromatic hydrocarbon photocurable resin compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
Showing the top 50 of 89 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →