Inventor · disambiguated record
Takeshi Koiwasaki
Also filed as: KOIWASAKI TAKESHI
8 granted patents·4 pending applications·12 citations·filing 2008–2024
77Inventor score
Top patents by PatentIndex Score
12 records- 0184US10252339B2Fine particle production apparatus and fine particle production methodPANASONIC IP MAN CO LTD·Filed 2016·Granted Apr 9, 2019·2 cites·6 claims
- 0284US10124406B2Production apparatus and production method for fine particlesPANASONIC IP MAN CO LTD·Filed 2018·Granted Nov 13, 2018·2 cites·14 claims
- 0382US8016982B2Sputtering apparatus and sputtering methodPANASONIC CORP·Filed 2008·Granted Sep 13, 2011·7 cites·8 claims
- 0468US2025059059A1Composite particle production method and composite particlePANASONIC IP MAN CO LTD·Filed 2024·Application pending·0 cites
- 0566US2023331573A1Fine-particle powder containing calcium oxide or calcium hydroxide and production method for samePANASONIC IP MAN CO LTD·Filed 2023·Application pending·0 cites
- 0665US2024199438A1Composite microparticle manufacturing method and composite microparticlesPANASONIC IP MAN CO LTD·Filed 2023·Application pending·0 cites
- 0761US2022200044A1All-solid-state battery and method for manufacturing samePANASONIC IP MAN CO LTD·Filed 2021·Application pending·0 cites
- 0853US10974220B2Fine particle producing apparatus and fine particle producing methodPANASONIC IP MAN CO LTD·Filed 2019·Granted Apr 13, 2021·0 cites·5 claims
- 0953US10898957B2Production apparatus and production method for fine particlesPANASONIC IP MAN CO LTD·Filed 2018·Granted Jan 26, 2021·0 cites·13 claims
- 1053US8349736B2Semiconductor device manufacturing method and semiconductor devicePANASONIC CORP·Filed 2011·Granted Jan 8, 2013·1 cites·4 claims
- 1147US10363540B2Production apparatus and production method for fine particlesPANASONIC IP MAN CO LTD·Filed 2017·Granted Jul 30, 2019·0 cites·11 claims
- 1245US7814796B2Partial pressure measuring method and partial pressure measuring apparatusPANASONIC CORP·Filed 2008·Granted Oct 19, 2010·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →