Inventor · disambiguated record
Takuro Kosaka
Also filed as: KOSAKA TAKURO
41 granted patents·16 pending applications·44 citations·filing 2014–2025
95Inventor score
Top patents by PatentIndex Score
57 records- 0196US10078260B2Phase shift mask blank, phase shift mask, and blank preparing methodSHINETSU CHEMICAL CO·Filed 2016·Granted Sep 18, 2018·7 cites·13 claims
- 0293US10678125B2Photomask blank and method for preparing photomaskSHINETSU CHEMICAL CO·Filed 2017·Granted Jun 9, 2020·5 cites·20 claims
- 0392US9366951B2Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure methodSHINETSU CHEMICAL CO·Filed 2014·Granted Jun 14, 2016·8 cites·11 claims
- 0490US9645485B2Halftone phase shift photomask blank and making methodSHINETSU CHEMICAL CO·Filed 2015·Granted May 9, 2017·4 cites·4 claims
- 0588US10564537B2Photomask blank, and preparation method thereofSHINETSU CHEMICAL CO·Filed 2017·Granted Feb 18, 2020·3 cites·10 claims
- 0687US12124162B2Substrate with film for reflective mask blank, reflective mask blank, and method for manufacturing reflective maskSHINETSU CHEMICAL CO·Filed 2022·Granted Oct 22, 2024·1 cites·12 claims
- 0787US9927695B2Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure methodSHINETSU CHEMICAL CO·Filed 2016·Granted Mar 27, 2018·3 cites·5 claims
- 0886US10545401B2Phase shift mask blank, phase shift mask, and blank preparing methodSHINETSU CHEMICAL CO·Filed 2018·Granted Jan 28, 2020·2 cites·24 claims
- 0986US10146122B2Halftone phase shift photomask blank and making methodSHINETSU CHEMICAL CO·Filed 2017·Granted Dec 4, 2018·2 cites·8 claims
- 1085US12050396B2Reflective mask blank, method of manufacturing thereof, and reflective maskSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 30, 2024·1 cites·10 claims
- 1184US10466583B2Halftone phase shift mask blank and halftone phase shift maskSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 5, 2019·2 cites·15 claims
- 1281US11061319B2Photomask blank and making methodSHINETSU CHEMICAL CO·Filed 2018·Granted Jul 13, 2021·2 cites·18 claims
- 1380US11644742B2Phase shift mask blank, manufacturing method thereof, and phase shift maskSHINETSU CHEMICAL CO·Filed 2022·Granted May 9, 2023·0 cites·20 claims
- 1480US9778560B2Method for preparing halftone phase shift photomask blankSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 3, 2017·2 cites·9 claims
- 1575US2025383596A1Reflective photomask blank, reflective photomask and method for manufacturing reflective photomask blankSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1673US11333965B2Phase shift mask blank, manufacturing method thereof, and phase shift maskSHINETSU CHEMICAL CO·Filed 2020·Granted May 17, 2022·0 cites·11 claims
- 1773US2024248388A1Substrate with Film for Reflective Mask Blank, and Reflective Mask BlankSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1872US10670957B2Halftone phase shift photomask blank, making method, and halftone phase shift photomaskSHINETSU CHEMICAL CO·Filed 2017·Granted Jun 2, 2020·0 cites·10 claims
- 1971US10372030B2Halftone phase shift mask blank and halftone phase shift maskSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 6, 2019·1 cites·21 claims
- 2070US9778559B2Method for preparing halftone phase shift photomask blankSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 3, 2017·1 cites·6 claims
- 2168US2025138410A1Reflective photomask blank and method for manufacturing reflective photomask blankSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2268US2025172862A1Reflective mask blank and manufacturing method thereofSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2366US2025138411A1Reflective photomask blank and method for manufacturing reflective photomaskSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2464US12353121B2Reflective mask blank, and reflective maskSHINETSU CHEMICAL CO·Filed 2022·Granted Jul 8, 2025·0 cites·8 claims
- 2564US11835851B2Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blankSHINETSU CHEMICAL CO·Filed 2021·Granted Dec 5, 2023·0 cites·16 claims
- 2664US10989999B2Halftone phase shift mask blank and halftone phase shift maskSHINETSU CHEMICAL CO·Filed 2019·Granted Apr 27, 2021·0 cites·17 claims
- 2764US2024337916A1Reflective mask blank, and manufacturing method of reflective maskSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2863US12474628B2Reflective mask blank and method for manufacturing reflective maskSHINETSU CHEMICAL CO·Filed 2022·Granted Nov 18, 2025·0 cites·9 claims
- 2963US11860529B2Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blankSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 2, 2024·0 cites·22 claims
- 3063US2025060659A1Reflective mask blank and manufacturing method of reflective maskSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 3163US2025060658A1Reflective mask blank and manufacturing method of reflective maskSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 3263US2024210813A1Reflective Mask Blank, Reflective Mask, and Manufacturing Method ThereofSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 3362US12197121B2Phase shift mask blank, manufacturing method of phase shift mask, and phase shift maskSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 14, 2025·0 cites·19 claims
- 3462US2021333702A1Substrate with Film for Reflective Mask Blank, and Reflective Mask BlankSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 3561US10859904B2Halftone phase shift photomask blank, making method, and halftone phase shift photomaskSHINETSU CHEMICAL CO·Filed 2020·Granted Dec 8, 2020·0 cites·17 claims
- 3661US10459333B2Halftone phase shift photomask blank and making methodSHINETSU CHEMICAL CO·Filed 2018·Granted Oct 29, 2019·0 cites·14 claims
- 3761US2024210812A1Reflective mask blankSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 3860US12265321B2Reflective mask blank, and method for manufacturing reflective maskSHINETSU CHEMICAL CO·Filed 2022·Granted Apr 1, 2025·0 cites·8 claims
- 3959US11307490B2Phase shift mask blank and phase shift maskSHINETSU CHEMICAL CO·Filed 2020·Granted Apr 19, 2022·0 cites·8 claims
- 4059US2024077797A1Reflective mask blank and method for manufacturing reflective maskSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 4157US12111215B2Imaging device and calibration methodSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2019·Granted Oct 8, 2024·0 cites·8 claims
- 4255US12207012B2Imaging device and electronic apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2021·Granted Jan 21, 2025·0 cites·23 claims
- 4355US11415874B2Method of manufacturing reflective mask blank, reflective mask blank, and method of manufacturing reflective maskSHINETSU CHEMICAL CO·Filed 2020·Granted Aug 16, 2022·0 cites·4 claims
- 4454US11422456B2Phase shift mask blank, method for producing phase shift mask, and phase shift maskSHINETSU CHEMICAL CO·Filed 2021·Granted Aug 23, 2022·0 cites·20 claims
- 4554US11327393B2Photomask blank and method for preparing photomaskSHINETSU CHEMICAL CO·Filed 2020·Granted May 10, 2022·0 cites·27 claims
- 4653US11789357B2Method of manufacturing reflective mask blank, and reflective mask blankSHINETSU CHEMICAL CO·Filed 2021·Granted Oct 17, 2023·0 cites·10 claims
- 4749US2024085246A1Measurement circuit and electronic equipmentSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2020·Application pending·0 cites
- 4848US9651858B2Binary photomask blank, preparation thereof, and preparation of binary photomaskSHINETSU CHEMICAL CO·Filed 2015·Granted May 16, 2017·0 cites·13 claims
- 4947US2025150734A1Imaging deviceSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2023·Application pending·0 cites
- 5046US9897911B2Halftone phase shift photomask blank, making method, and halftone phase shift photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Feb 20, 2018·0 cites·14 claims
Showing the top 50 of 57 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →