Inventor · disambiguated record
Takanori Kudo
Also filed as: KUDO TAKANORI
31 granted patents·8 pending applications·729 citations·filing 1986–2024
97Inventor score
Files withHITACHI LTD8HOECHST JAPAN7CLARIANT FINANCE BVI LTD6AZ ELECTRONIC MATERIALS USA4MERCK PATENT GMBH4
Top patents by PatentIndex Score
39 records- 0197US6723488B2Photoresist composition for deep UV radiation containing an additiveCLARIANT FINANCE BVI LTD·Filed 2001·Granted Apr 20, 2004·99 cites·13 claims
- 0296US6991888B2Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Jan 31, 2006·84 cites·19 claims
- 0393US7595141B2Composition for coating over a photoresist patternAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted Sep 29, 2009·46 cites·12 claims
- 0489US9274426B2Antireflective coating compositions and processes thereofAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2014·Granted Mar 1, 2016·12 cites·20 claims
- 0589US5525453APositive-working radiation-sensitive mixtureHOECHST JAPAN·Filed 1994·Granted Jun 11, 1996·61 cites·20 claims
- 0688US6737492B2Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coatingCLARIANT FINANCE BVI LTD·Filed 2002·Granted May 18, 2004·28 cites·15 claims
- 0784US5663035ARadiation-sensitive mixture comprising a basic iodonium compoundHOECHST JAPAN·Filed 1995·Granted Sep 2, 1997·57 cites·16 claims
- 0881US8623589B2Bottom antireflective coating compositions and processes thereofKUDO TAKANORI·Filed 2011·Granted Jan 7, 2014·5 cites·18 claims
- 0981US6610465B2Process for producing film forming resins for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 2001·Granted Aug 26, 2003·23 cites·53 claims
- 1079US5691100APattern forming material including photoacid and photobase generators for large exposure latitudeHOECHST JAPAN·Filed 1996·Granted Nov 25, 1997·63 cites·9 claims
- 1174US5882843APhotosensitive resin composition for color filter productionHOECHST JAPAN·Filed 1995·Granted Mar 16, 1999·40 cites·8 claims
- 1274US5782032ACoal gasification furnace with a slag tap hole of specific shapeHITACHI LTD·Filed 1996·Granted Jul 21, 1998·32 cites·8 claims
- 1370US5498457AMagnetic recording medium having a lubricant layer comprising ionically interbonded fluoropolyethers with acidic and basic terminal groupsHITACHI LTD·Filed 1994·Granted Mar 12, 1996·19 cites·18 claims
- 1470US2024337945A1Thick film-forming composition and method for manufacturing cured film using the sameMERCK PATENT GMBH·Filed 2024·Application pending·0 cites
- 1569US6800416B2Negative deep ultraviolet photoresistCLARIANT FINANCE BVI LTD·Filed 2002·Granted Oct 5, 2004·9 cites·9 claims
- 1666US9152051B2Antireflective coating composition and process thereofRAHMAN M DALIL·Filed 2013·Granted Oct 6, 2015·1 cites·20 claims
- 1765US4966797AProcess for producing magnetic recording medium, magnetic paint, and magnetic diskHITACHI LTD·Filed 1989·Granted Oct 30, 1990·20 cites·26 claims
- 1864US5595855ARadiation sensitive compositionHOECHST JAPAN·Filed 1995·Granted Jan 21, 1997·24 cites·18 claims
- 1961US7601480B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Oct 13, 2009·6 cites·8 claims
- 2059US7122291B2Photoresist compositionsAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted Oct 17, 2006·15 cites·12 claims
- 2158US5843319APositive-working radiation-sensitive mixtureHOECHST JAPAN·Filed 1997·Granted Dec 1, 1998·16 cites·12 claims
- 2258US2025320174A1Spin on metal-organic formulationsMERCK PATENTS GMBH·Filed 2022·Application pending·0 cites
- 2356US6468718B1Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coatingCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 22, 2002·14 cites·10 claims
- 2455US5725615AEntrained bed coal gasification reactor and method of gasifying coalHITACHI LTD·Filed 1995·Granted Mar 10, 1998·12 cites·29 claims
- 2554US4794035AMagnetic recording mediumHITACHI LTD·Filed 1987·Granted Dec 27, 1988·9 cites·9 claims
- 2653US2022365432A1Chemically amplified photoresistMERCK PATENT GMBH·Filed 2020·Application pending·0 cites
- 2750US6372403B1Photosensitive resin compositionCLARIANT FINANCE BVI LTD·Filed 1999·Granted Apr 16, 2002·13 cites·9 claims
- 2849US5093211AMagnetic recording medium comprising a surface treatment layer provided on the magnetic layer of specified fluorocarboxylic acid amine saltsHITACHI LTD·Filed 1989·Granted Mar 3, 1992·7 cites·6 claims
- 2947US12360453B2PAG-free positive chemically amplified resist composition and methods of using the sameMERCK PATENT GMBH·Filed 2020·Granted Jul 15, 2025·0 cites·21 claims
- 3043US5008128AProcess for producing information recording mediumHITACHI LTD·Filed 1989·Granted Apr 16, 1991·5 cites·10 claims
- 3143US2015309403A1Antireflective coating compositions and processes thereofAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2014·Application pending·0 cites
- 3242US12276909B2Novolak/DNQ based, chemically amplified photoresistMERCK PATENT GMBH·Filed 2019·Granted Apr 15, 2025·0 cites·17 claims
- 3341US2011086312A1Positive-Working Photoimageable Bottom Antireflective CoatingDAMMEL RALPH R·Filed 2009·Application pending·0 cites
- 3439US5641594AColored, photosensitive resin compositionHOECHST JAPAN·Filed 1994·Granted Jun 24, 1997·5 cites·18 claims
- 3538US8252503B2Photoresist compositionsCHAKRAPANI SRINIVASAN·Filed 2007·Granted Aug 28, 2012·0 cites·7 claims
- 3636US2004106742A1Coating compositionFiled 2003·Application pending·0 cites
- 3734US4722859AMagnetic recording mediumHITACHI LTD·Filed 1986·Granted Feb 2, 1988·4 cites·3 claims
- 3832US2012122029A1Underlayer Developable Coating Compositions and Processes ThereofKUDO TAKANORI·Filed 2010·Application pending·0 cites
- 3932US2003235775A1Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compoundsFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →