Inventor · disambiguated record
Ta-Cheng Lien
Also filed as: LIEN TA-CHENG
76 granted patents·32 pending applications·155 citations·filing 2012–2025
98Inventor score
Top patents by PatentIndex Score
108 records- 0198US8679707B2Method of fabricating a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Mar 25, 2014·86 cites·20 claims
- 0297US12153339B2Network type pellicle membrane and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 26, 2024·4 cites·20 claims
- 0395US12181797B2Extreme ultraviolet mask with alloy based absorbersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 31, 2024·2 cites·20 claims
- 0495US12050399B2Pellicle assembly and method of making sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 30, 2024·2 cites·20 claims
- 0595US11385538B2Cleaning method for photo masks and apparatus thereforTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 12, 2022·3 cites·20 claims
- 0694US12085843B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·1 cites·20 claims
- 0793US10534256B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 14, 2020·6 cites·19 claims
- 0893US9759997B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 12, 2017·7 cites·20 claims
- 0992US11550229B1Enhancing lithography operation for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 10, 2023·2 cites·20 claims
- 1091US12153351B2Enhancing lithography operation for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 26, 2024·1 cites·20 claims
- 1191US11829076B2Enhancing lithography operation for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 28, 2023·1 cites·20 claims
- 1291US11714350B2Method of fabricating and servicing a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 1, 2023·1 cites·20 claims
- 1391US11561464B2EUV masks to prevent carbon contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 24, 2023·1 cites·20 claims
- 1490US11294271B2Mask for extreme ultraviolet photolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·2 cites·20 claims
- 1590US11294274B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·2 cites·19 claims
- 1690US11204545B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 21, 2021·2 cites·20 claims
- 1789US12346027B2Methods of making a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 1, 2025·0 cites·20 claims
- 1889US11815804B2EUV mask blank and method of making EUV mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 14, 2023·1 cites·20 claims
- 1989US11789356B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 17, 2023·1 cites·20 claims
- 2088US12339579B2Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jun 24, 2025·0 cites·20 claims
- 2188US2025355360A1Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2288US2025362580A1Extreme ultraviolet mask with capping layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2388US2025362588A1Reticle containerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2487US12366797B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 22, 2025·0 cites·20 claims
- 2587US11619875B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 4, 2023·1 cites·20 claims
- 2687US11360384B2Method of fabricating and servicing a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 14, 2022·4 cites·20 claims
- 2787US8916482B2Method of making a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Dec 23, 2014·5 cites·12 claims
- 2887US2025306450A1Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2986US12346019B2Reflective maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 1, 2025·0 cites·20 claims
- 3086US12259649B2Cleaning method for photo masks and apparatus thereforTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 25, 2025·0 cites·20 claims
- 3186US11899357B2Lithography maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 13, 2024·1 cites·20 claims
- 3286US11237477B2Reticle containerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Feb 1, 2022·3 cites·20 claims
- 3386US10036951B2Pellicle assembly and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 31, 2018·3 cites·18 claims
- 3486US2024385506A1Euv photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3585US12044960B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 23, 2024·0 cites·20 claims
- 3685US9535317B2Treating a capping layer of a maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 3, 2017·4 cites·20 claims
- 3785US2025314956A1Reflective masks and methods of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3885US2025298304A1Reflective mask and method of making semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3984US12346023B2Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 1, 2025·0 cites·20 claims
- 4084US12153337B2Extreme ultraviolet mask with tantalum base alloy absorberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 26, 2024·0 cites·20 claims
- 4184US12147154B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 19, 2024·0 cites·20 claims
- 4284US11960201B2Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 16, 2024·0 cites·20 claims
- 4384US11829062B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 28, 2023·1 cites·20 claims
- 4484US11106126B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 31, 2021·3 cites·20 claims
- 4584US2025298305A1Reflective mask and method of making semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4683US12265322B2EUV mask blank and method of making EUV mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 1, 2025·0 cites·20 claims
- 4783US11988953B2EUV masks to prevent carbon contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 21, 2024·0 cites·20 claims
- 4883US2025323050A1Methods and systems for improving plasma ignition stabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4983US2024369921A1Reticle enclosure for lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 5082US12169357B2Method of fabricating and servicing a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 17, 2024·0 cites·20 claims
Showing the top 50 of 108 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →