Inventor · disambiguated record
Taro Miyoshi
Also filed as: MIYOSHI TARO
3 granted patents·11 pending applications·4 citations·filing 2021–2024
52Inventor score
Files withFUJIFILM CORP14
Top patents by PatentIndex Score
14 records- 0193US12164230B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compoundFUJIFILM CORP·Filed 2021·Granted Dec 10, 2024·4 cites·9 claims
- 0270US2025004377A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0364US2024210826A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compoundFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0464US2023120139A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 0563US2024241443A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0662US2022382151A1Method for producing resin, method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and resinFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 0761US2023384674A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 0861US2023393473A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic devicesFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 0959US12510822B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, actinic ray-sensitive or radiation-sensitive resin composition for manufacturing photomask, and method for manufacturing photomaskFUJIFILM CORP·Filed 2022·Granted Dec 30, 2025·0 cites·11 claims
- 1059US2023408920A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1158US2023393472A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, positive tone pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1254US12265329B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Apr 1, 2025·0 cites·5 claims
- 1354US2023123203A1Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and method for producing onium saltFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 1449US2022206386A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →