Inventor · disambiguated record
Takayoshi Nakahara
Also filed as: NAKAHARA TAKAYOSHI
13 granted patents·2 pending applications·1 citations·filing 2017–2024
80Inventor score
Files withSHINETSU CHEMICAL CO15
Top patents by PatentIndex Score
15 records- 0187US12147160B2Resist underlayer film material, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2021·Granted Nov 19, 2024·1 cites·11 claims
- 0263US11680133B2Material for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jun 20, 2023·0 cites·20 claims
- 0362US2023400770A1Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer FilmSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 0459US2024337944A1Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer FilmSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0558US12351742B2Material for forming adhesive film, patterning process, and method for forming adhesive filmSHINETSU CHEMICAL CO·Filed 2022·Granted Jul 8, 2025·0 cites·20 claims
- 0657US12498639B2Material for forming adhesive film, method for forming adhesive film using the same, and patterning process using material for forming adhesive filmSHINETSU CHEMICAL CO·Filed 2022·Granted Dec 16, 2025·0 cites·18 claims
- 0756US10131603B2Method for reducing metal of sugar-alcohol compound and sugar-alcohol compoundSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 20, 2018·0 cites·12 claims
- 0853US12105420B2Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymerSHINETSU CHEMICAL CO·Filed 2021·Granted Oct 1, 2024·0 cites·21 claims
- 0953US12032293B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 9, 2024·0 cites·17 claims
- 1052US12013640B2Resist underlayer film material, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2021·Granted Jun 18, 2024·0 cites·19 claims
- 1152US11675268B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jun 13, 2023·0 cites·19 claims
- 1250US11822247B2Material for forming organic film, method for forming organic film, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2021·Granted Nov 21, 2023·0 cites·21 claims
- 1348US11720023B2Material for forming organic film, method for forming organic film, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2020·Granted Aug 8, 2023·0 cites·20 claims
- 1446US12215221B2Material for forming organic film, method for forming organic film, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 4, 2025·0 cites·18 claims
- 1545US11709429B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 25, 2023·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →