Inventor · disambiguated record
Taku Nakao
Also filed as: NAKAO TAKU
12 granted patents·1 pending application·104 citations·filing 1993–2005
91Inventor score
Files withTOKYO OHKA KOGYO CO LTD12
Top patents by PatentIndex Score
13 records- 0186US5434031APositive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additiveTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jul 18, 1995·16 cites·9 claims
- 0277US6605417B2Method for decreasing surface defects of patterned resist layerTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Aug 12, 2003·14 cites·10 claims
- 0364US5601961AHigh-sensitivity positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Feb 11, 1997·24 cites·44 claims
- 0461US5498514ALithographic double-coated patterning plate with undercoat levelling layerTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 12, 1996·13 cites·3 claims
- 0557US7402372B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Jul 22, 2008·5 cites·12 claims
- 0656US7364831B2Positive resist composition and resist pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Apr 29, 2008·1 cites·8 claims
- 0756US5478692APositive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenoneTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Dec 26, 1995·13 cites·10 claims
- 0846US7094924B2Method for decreasing surface defects of patterned resist layerTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 22, 2006·1 cites·1 claims
- 0945US6444394B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 3, 2002·5 cites·4 claims
- 1042US2004072103A1Positive-working photoresist compositionFiled 2003·Application pending·0 cites
- 1139US5599653APattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layerTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Feb 4, 1997·5 cites·2 claims
- 1238US5702862APositive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanoneTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 30, 1997·6 cites·9 claims
- 1334US6677103B2Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jan 13, 2004·1 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →