Inventor · disambiguated record
Takumi Namiki
Also filed as: NAMIKI TAKUMI
9 granted patents·10 pending applications·4 citations·filing 2010–2024
76Inventor score
Files withTOKYO OHKA KOGYO CO LTD19
Top patents by PatentIndex Score
19 records- 0179US9063430B2Coating agent for forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jun 23, 2015·2 cites·7 claims
- 0277US11358976B2Surface treatment agent, surface treatment method, and area selective deposition methodTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Jun 14, 2022·1 cites·8 claims
- 0364US11965111B2Surface treatment agent and surface treatment methodTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Apr 23, 2024·1 cites·2 claims
- 0464US2024279569A1Aqueous cleaning liquidTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0558US2025201546A1Method for processing substrate, kit for processing substrate, and method for manufacturing semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0656US2024271060A1Aqueous cleaning liquidTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0756US2024271061A1Aqueous cleaning liquidTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0856US2024271062A1Aqueous cleaning liquidTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0950US10988649B2Method for imparting water repellency to substrate, surface treatment agent, and method for suppressing collapse of organic pattern or inorganic pattern in cleaning substrate surface with cleaning liquidTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Apr 27, 2021·0 cites·10 claims
- 1044US10597616B2Cleaning liquid and method for manufacturing the sameTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Mar 24, 2020·0 cites·13 claims
- 1143US10961422B2Surface treatment liquid, surface treatment method, and method for suppressing pattern collapseTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Mar 30, 2021·0 cites·12 claims
- 1243US8980534B2Method for forming fine pattern, and coating agent for pattern finingTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Mar 17, 2015·0 cites·4 claims
- 1339US2019374982A1Method for treating substrate and rinsing liquidTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 1438US10597609B2Cleaning liquid, anticorrosion agent, and method for manufacturing the sameTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Mar 24, 2020·0 cites·13 claims
- 1538US2013122425A1Method for forming fine pattern, and coating forming agent for pattern finingTOKYO OHKA KOGYO CO LTD·Filed 2012·Application pending·0 cites
- 1637US2020062968A1Surface treatment agent and surface treatment methodTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 1735US9417532B2Coating agent for forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Aug 16, 2016·0 cites·9 claims
- 1835US2011065053A1Material for forming protective film and method for forming photoresist patternTOKYO OHKA KOGYO CO LTD·Filed 2010·Application pending·0 cites
- 1935US2019048293A1Cleaning solution and cleaning method for a semiconductor substrate or deviceTOKYO OHKA KOGYO CO LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →