Inventor · disambiguated record
Takayuki Negishi
Also filed as: NEGISHI TAKAYUKI
18 granted patents·16 pending applications·8 citations·filing 2004–2025
88Inventor score
Top patents by PatentIndex Score
34 records- 0192US12195658B2Treatment liquid for semiconductor wafersTOKUYAMA CORP·Filed 2021·Granted Jan 14, 2025·2 cites·10 claims
- 0290US11390577B2Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafersTOKUYAMA CORP·Filed 2020·Granted Jul 19, 2022·2 cites·12 claims
- 0379US11390829B2Treatment liquid for semiconductor wafers, which contains hypochlorite ionsTOKUYAMA CORP·Filed 2019·Granted Jul 19, 2022·2 cites·15 claims
- 0477US2025313466A1Method for producing halogen oxyacid solutionTOKUYAMA CORP·Filed 2025·Application pending·0 cites
- 0576US12247299B2Treatment liquid for semiconductor with ruthenium and method of producing the sameTOKUYAMA CORP·Filed 2023·Granted Mar 11, 2025·0 cites·6 claims
- 0672US11572331B2Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafersTOKUYAMA CORP·Filed 2022·Granted Feb 7, 2023·0 cites·12 claims
- 0772US2025257264A1Semiconductor wafer treatment liquid containing hypochlorite ions and ph bufferTOKUYAMA CORP·Filed 2025·Application pending·0 cites
- 0872US2024182404A1INHIBITOR FOR RuO4 GAS GENERATION AND METHOD FOR INHIBITING RuO4 GAS GENERATIONTOKUYAMA CORP·Filed 2024·Application pending·0 cites
- 0968US12466732B2Method for producing halogen oxyacid solutionTOKUYAMA CORP·Filed 2021·Granted Nov 11, 2025·0 cites·10 claims
- 1066US11738997B2Method and apparatus for producing halogen oxyacid solutionTOKUYAMA CORP·Filed 2021·Granted Aug 29, 2023·0 cites·16 claims
- 1166US10486614B2Speaker system for mobile objectPIONEER CORP·Filed 2016·Granted Nov 26, 2019·2 cites·9 claims
- 1264US11674230B2Treatment liquid for semiconductor with ruthenium and method of producing the sameTOKUYAMA CORP·Filed 2020·Granted Jun 13, 2023·0 cites·12 claims
- 1364US2022325205A1Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlorite IonsTOKUYAMA CORP·Filed 2022·Application pending·0 cites
- 1462US12444617B2Semiconductor wafer processing liquid containing hypobromite ions and PH buffering agentTOKUYAMA CORP·Filed 2021·Granted Oct 14, 2025·0 cites·18 claims
- 1561US12509632B2Treatment liquid for semiconductors and method for producing sameTOKUYAMA CORP·Filed 2021·Granted Dec 30, 2025·0 cites·17 claims
- 1661US11932590B2Inhibitor for RuO4 gas generation and method for inhibiting RuO4 gas generationTOKUYAMA CORP·Filed 2020·Granted Mar 19, 2024·0 cites·8 claims
- 1757US12247298B2Semiconductor wafer treatment liquid and production method thereofTOKUYAMA CORP·Filed 2021·Granted Mar 11, 2025·0 cites·13 claims
- 1857US12024663B2Onium salt-containing treatment liquid for semiconductor wafersTOKUYAMA CORP·Filed 2020·Granted Jul 2, 2024·0 cites·19 claims
- 1956US2022010206A1Semiconductor wafer treatment liquid containing hypochlorite ions and ph bufferTOKUYAMA CORP·Filed 2020·Application pending·0 cites
- 2053US11572533B2Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor waferTOKUYAMA CORP·Filed 2019·Granted Feb 7, 2023·0 cites·18 claims
- 2151US2022328320A1Semiconductor treatment liquidTOKUYAMA CORP·Filed 2022·Application pending·0 cites
- 2250US2024055272A1Method for processing semiconductor containing transition metal, method for producing semiconductor containing transition metal, and processing liquid for semiconductorsTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 2350US2024087911A1Method for treating transition metal semiconductor, and reducing agent-containing treatment liquid for transition metal oxideTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 2450US2022316996A1Ruthenium oxide gas absorbent liquid, analysis method for ruthenium oxide, trap device, and quantitative analyzerTOKUYAMA CORP·Filed 2020·Application pending·0 cites
- 2548US2022033976A1Method for inhibiting generation of ruthenium-containing gas from ruthenium-containing liquidTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 2647US11509983B2Audio reproduction deviceSONY GROUP CORP·Filed 2019·Granted Nov 22, 2022·0 cites·8 claims
- 2745US11070908B2Sound generator for mobile entitiesPIONEER CORP·Filed 2018·Granted Jul 20, 2021·0 cites·12 claims
- 2845US2005041829A1Speaker and method of installing the samePIONEER CORP·Filed 2004·Application pending·0 cites
- 2945US2005041820A1Method of mounting and driving speakersPIONEER CORP·Filed 2004·Application pending·0 cites
- 3043US10979683B2White balance adjustment device and white balance adjustment methodCLARION CO LTD·Filed 2018·Granted Apr 13, 2021·0 cites·5 claims
- 3143US2024089643A1Reproduction system, display apparatus, and reproduction apparatusSONY GROUP CORP·Filed 2021·Application pending·0 cites
- 3241US2005155815A1Standing wave absorbing device for vehiclePIONEER TOHOKU CORP·Filed 2004·Application pending·0 cites
- 3339US2017222237A1Odorant for Fuel Gases for Anion Membrane Fuel Cells, Fuel Gas and Power Generation System Using Anion Membrane Fuel CellTOKUYAMA CORP·Filed 2015·Application pending·0 cites
- 3433US2018244212A1Speaker system for mobile objectPIONEER CORP·Filed 2016·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Takayuki Negishi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →