Inventor · disambiguated record
Taiga Ogose
Also filed as: OGOSE TAIGA
3 granted patents·10 pending applications·1 citations·filing 2022–2025
46Inventor score
Files withSHINETSU CHEMICAL CO13
Top patents by PatentIndex Score
13 records- 0187US12124162B2Substrate with film for reflective mask blank, reflective mask blank, and method for manufacturing reflective maskSHINETSU CHEMICAL CO·Filed 2022·Granted Oct 22, 2024·1 cites·12 claims
- 0275US2025383596A1Reflective photomask blank, reflective photomask and method for manufacturing reflective photomask blankSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0368US2025138410A1Reflective photomask blank and method for manufacturing reflective photomask blankSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0468US2025172862A1Reflective mask blank and manufacturing method thereofSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0566US2025138411A1Reflective photomask blank and method for manufacturing reflective photomaskSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0664US12353121B2Reflective mask blank, and reflective maskSHINETSU CHEMICAL CO·Filed 2022·Granted Jul 8, 2025·0 cites·8 claims
- 0764US2024337916A1Reflective mask blank, and manufacturing method of reflective maskSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0863US2025060659A1Reflective mask blank and manufacturing method of reflective maskSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0963US2025060658A1Reflective mask blank and manufacturing method of reflective maskSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1063US2024210813A1Reflective Mask Blank, Reflective Mask, and Manufacturing Method ThereofSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1161US2024210812A1Reflective mask blankSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1260US12265321B2Reflective mask blank, and method for manufacturing reflective maskSHINETSU CHEMICAL CO·Filed 2022·Granted Apr 1, 2025·0 cites·8 claims
- 1359US2024077797A1Reflective mask blank and method for manufacturing reflective maskSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →