Inventor · disambiguated record
Takahiro Onoue
Also filed as: ONOUE TAKAHIRO
29 granted patents·7 pending applications·558 citations·filing 2007–2023
96Inventor score
Top patents by PatentIndex Score
36 records- 0198US11480867B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Oct 25, 2022·4 cites·21 claims
- 0297US10481484B2Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Nov 19, 2019·12 cites·20 claims
- 0397US8623528B2Method of manufacturing perpendicular magnetic recording medium and perpendicular magnetic recording mediumUMEZAWA TEIICHIRO·Filed 2009·Granted Jan 7, 2014·73 cites·2 claims
- 0497US8592061B2Magnetic recording medium with controlled grain diametersONOUE TAKAHIRO·Filed 2007·Granted Nov 26, 2013·70 cites·9 claims
- 0597US8580410B2Perpendicular magnetic recording medium and process for manufacture thereofONOUE TAKAHIRO·Filed 2009·Granted Nov 12, 2013·78 cites·17 claims
- 0697US8076013B2Magnetic recording medium, magnetic recording medium manufacturing method, and magnetic diskSONOBE YOSHIAKI·Filed 2008·Granted Dec 13, 2011·87 cites·15 claims
- 0796US8603649B2Perpendicular magnetic recording mediumONOUE TAKAHIRO·Filed 2008·Granted Dec 10, 2013·69 cites·4 claims
- 0896US8431258B2Perpendicular magnetic recording medium and method of manufacturing the sameONOUE TAKAHIRO·Filed 2010·Granted Apr 30, 2013·71 cites·5 claims
- 0994US9864267B2Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Jan 9, 2018·8 cites·12 claims
- 1094US8404370B2Perpendicular magnetic recording medium and method of manufacturing the sameSATO TOKICHIRO·Filed 2010·Granted Mar 26, 2013·72 cites·7 claims
- 1185US9740091B2Substrate with multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method of manufacturing the same, and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2014·Granted Aug 22, 2017·4 cites·14 claims
- 1284US11003068B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted May 11, 2021·2 cites·20 claims
- 1381US12135496B2Reflective mask blank and reflective maskHOYA CORP·Filed 2023·Granted Nov 5, 2024·0 cites·20 claims
- 1478US11880130B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Jan 23, 2024·0 cites·19 claims
- 1576US9159351B2Perpendicular magnetic recording medium and method of manufacturing the sameSAKAMOTO KAZUAKI·Filed 2008·Granted Oct 13, 2015·3 cites·11 claims
- 1675US9383637B2Substrate with multilayer reflective film, reflective mask blank for EUV lithography, method of manufacturing reflective mask for EUV lithography and method of manufacturing semiconductor deviceHOYA CORP·Filed 2013·Granted Jul 5, 2016·3 cites·22 claims
- 1772US11852964B2Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 1863US9064518B2Perpendicular magnetic recording mediumONOUE TAKAHIRO·Filed 2009·Granted Jun 23, 2015·0 cites·9 claims
- 1962US8859118B2Perpendicular magnetic recording mediumTACHIBANA TOSHIAKI·Filed 2011·Granted Oct 14, 2014·2 cites·26 claims
- 2059US11048159B2Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jun 29, 2021·0 cites·24 claims
- 2155US9183869B2Perpendicular magnetic recording medium and method of manufacturing perpendicular magnetic recording mediumWD MEDIA SINGAPORE PTE LTD·Filed 2013·Granted Nov 10, 2015·0 cites·18 claims
- 2255US9142241B2Perpendicular magnetic recording medium and method of manufacturing the sameWD MEDIA SINGAPORE PTE LTD·Filed 2013·Granted Sep 22, 2015·0 cites·8 claims
- 2354US9047903B2Perpendicular magnetic recording medium and process for manufacture thereofONOUE TAKAHIRO·Filed 2009·Granted Jun 2, 2015·0 cites·4 claims
- 2454US8871368B2Perpendicular magnetic recording medium and process for manufacture thereofONOUE TAKAHIRO·Filed 2009·Granted Oct 28, 2014·0 cites·13 claims
- 2553US11454878B2Substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Sep 27, 2022·0 cites·19 claims
- 2653US11237472B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2018·Granted Feb 1, 2022·0 cites·20 claims
- 2753US9720317B2Substrate with a multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography and method of manufacturing the same, and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2014·Granted Aug 1, 2017·0 cites·12 claims
- 2853US2011097604A1Perpendicular magnetic recording mediumWD MEDIA SINGAPORE PTE LTD·Filed 2009·Application pending·0 cites
- 2947US2009191331A1Perpendicular magnetic recording medium manufacturing methodHOYA CORP·Filed 2007·Application pending·0 cites
- 3047US2021096456A1Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2020·Application pending·0 cites
- 3147US2009117408A1Perpendicular magnetic recording disk and method of manufacturing the sameHOYA CORP·Filed 2007·Application pending·0 cites
- 3247US2009311557A1Perpendicular magnetic recording disk and method of manufacturing the sameONOUE TAKAHIRO·Filed 2007·Application pending·0 cites
- 3343US2015262602A1Perpendicular magnetic recording mediumWD MEDIA SINGAPORE PTE LTD·Filed 2015·Application pending·0 cites
- 3442US2020371421A1Reflective mask blank, reflective mask and method for producing same, and method for producing semiconductor deviceHOYA CORP·Filed 2018·Application pending·0 cites
- 3539US8895163B2Perpendicular magnetic recording mediumONOUE TAKAHIRO·Filed 2010·Granted Nov 25, 2014·0 cites·4 claims
- 3632US8883249B2Method of producing a perpendicular magnetic recording mediumTACHIBANA TOSHIAKI·Filed 2010·Granted Nov 11, 2014·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →