Inventor · disambiguated record
Tamotsu Oowada
Also filed as: OOWADA TAMOTSU
4 granted patents·3 pending applications·0 citations·filing 2019–2022
51Inventor score
Files withSHINETSU CHEMICAL CO7
Top patents by PatentIndex Score
7 records- 0153US11693318B2Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrixSHINETSU CHEMICAL CO·Filed 2019·Granted Jul 4, 2023·0 cites·17 claims
- 0249US12216405B2Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting deviceSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 4, 2025·0 cites·19 claims
- 0348US2024203755A1Sheet, handling sheet for thinned wafer, method for handling thin wafer, and method for handling thin deviceSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0447US11161932B2Resin composition, resin film, semiconductor laminate, method for producing semiconductor laminate and method for producing semiconductor deviceSHINETSU CHEMICAL CO·Filed 2020·Granted Nov 2, 2021·0 cites·14 claims
- 0544US2023178412A1Temporary adhesion method, device wafer processing method, laminate for temporary adhesion, and laminate for device wafer processingSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 0642US11294284B2Photosensitive resin composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Apr 5, 2022·0 cites·10 claims
- 0742US2020157348A1Photosensitive resin composition, pattern forming process, and antireflection filmSHINETSU CHEMICAL CO·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →