Inventor · disambiguated record
Takashi Sawamura
Also filed as: SAWAMURA TAKASHI
14 granted patents·8 pending applications·2 citations·filing 2016–2025
82Inventor score
Top patents by PatentIndex Score
22 records- 0174US10604618B2Compound, method for manufacturing the compound, and composition for forming organic filmSHINETSU CHEMICAL CO·Filed 2018·Granted Mar 31, 2020·1 cites·13 claims
- 0273US2025383600A1Benzenesulfonic acid salt compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0370US11022882B2Compound and composition for forming organic filmSHINETSU CHEMICAL CO·Filed 2018·Granted Jun 1, 2021·1 cites·3 claims
- 0466US2025289931A1Polyvalent ammonium salt compound, composition for forming silicon-containing resist underlayer film, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0559US12379661B2Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic filmSHINETSU CHEMICAL CO·Filed 2021·Granted Aug 5, 2025·0 cites·23 claims
- 0659US2025237953A1Silicon-containing sulfonium salt compound, composition for forming a silicon-containing resist underlayer film, and patterning processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0758US2024363335A1Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And CompoundSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0857US2024103370A1Composition For Forming Adhesive Film, Patterning Process, And Method For Forming Adhesive FilmSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 0957US2024103365A1Pattern Forming MethodSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1056US11886118B2Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic filmSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 30, 2024·0 cites·33 claims
- 1153US11851530B2Material for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2021·Granted Dec 26, 2023·0 cites·21 claims
- 1253US11676814B2Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Jun 13, 2023·0 cites·23 claims
- 1352US11675268B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jun 13, 2023·0 cites·19 claims
- 1451US11500292B2Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic filmSHINETSU CHEMICAL CO·Filed 2020·Granted Nov 15, 2022·0 cites·25 claims
- 1549US2022269175A1Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic filmSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1646US11692066B2Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic filmSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 4, 2023·0 cites·21 claims
- 1746US11635691B2Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Apr 25, 2023·0 cites·21 claims
- 1846US11307497B2Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Apr 19, 2022·0 cites·17 claims
- 1945US11709429B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 25, 2023·0 cites·18 claims
- 2044US10998197B2Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 4, 2021·0 cites·20 claims
- 2142US11181821B2Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2018·Granted Nov 23, 2021·0 cites·5 claims
- 2232US2016331000A1Denatured glucomannanSAWAMURA TAKASHI·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →