Inventor · disambiguated record
Takeo Shioya
Also filed as: SHIOYA TAKEO
11 granted patents·41 citations·filing 1999–2021
87Inventor score
Top patents by PatentIndex Score
11 records- 0184US8697343B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionNAKAGAWA HIROKI·Filed 2007·Granted Apr 15, 2014·7 cites·8 claims
- 0278US11036133B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2019·Granted Jun 15, 2021·0 cites·18 claims
- 0376US11681222B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2021·Granted Jun 20, 2023·0 cites·20 claims
- 0471US9354523B2Composition for resist pattern-refinement, and fine pattern-forming methodJSR CORP·Filed 2015·Granted May 31, 2016·2 cites·10 claims
- 0571US8927200B2Double patterning methodJSR CORP·Filed 2013·Granted Jan 6, 2015·3 cites·14 claims
- 0667US10620534B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2018·Granted Apr 14, 2020·0 cites·14 claims
- 0765US6337171B1Radiation-sensitive resin compositionJSR CORP·Filed 1999·Granted Jan 8, 2002·24 cites·25 claims
- 0861US10082733B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2016·Granted Sep 25, 2018·0 cites·14 claims
- 0961US9213236B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2014·Granted Dec 15, 2015·0 cites·11 claims
- 1060US6403288B1Resist pattern formation methodJSR CORP·Filed 2000·Granted Jun 11, 2002·5 cites·17 claims
- 1159US9500950B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2015·Granted Nov 22, 2016·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →