Inventor · disambiguated record
Tadashi Sugihara
Also filed as: SUGIHARA TADASHI
12 granted patents·196 citations·filing 1985–1994
91Inventor score
Top patents by PatentIndex Score
12 records- 0195US5585574AShaft having a magnetostrictive torque sensor and a method for making sameMITSUBISHI MATERIALS CORP·Filed 1994·Granted Dec 17, 1996·96 cites·16 claims
- 0281US4619697ASputtering target material and process for producing the sameMITSUBISHI METAL CORP·Filed 1985·Granted Oct 28, 1986·45 cites·23 claims
- 0348US4968665ATarget used for formation of superconductive oxide film, process of producing thereof, and process of forming superconductive oxide film on substrate using the sameMITSUBISHI METAL CORP·Filed 1989·Granted Nov 6, 1990·12 cites·20 claims
- 0448US4968664ASingle-crystal wafer having a superconductive ceramic thin film formed thereonMITSUBISHI METAL CORP·Filed 1989·Granted Nov 6, 1990·8 cites·18 claims
- 0538US5026680AMethod of manufacturing a powder of bi-based superconductive oxide containing lead and method of manufacturing a sintered body therefromMITSUBISHI METAL CORP·Filed 1989·Granted Jun 25, 1991·7 cites·15 claims
- 0636US5236889AProcess for producing bi-ca-sr-cu-o, tl-ca-sr-cu-o and tl-ba-ca-cu-o superconducting ceramicsMITSUBISHI MATERIALS CORP·Filed 1989·Granted Aug 17, 1993·7 cites·9 claims
- 0736US5019554AStructure of superconductive wiring having SiAlON buffer layer thereunderMITSUBISHI METAL CORP·Filed 1988·Granted May 28, 1991·7 cites·4 claims
- 0834US4929597ASuperconductor containing internal stress absorberMITSUBISHI METAL CORP·Filed 1989·Granted May 29, 1990·4 cites·8 claims
- 0931US5077269ASputtering target used for forming quinary superconductive oxideMITSUBISHI METAL CORP·Filed 1989·Granted Dec 31, 1991·3 cites·2 claims
- 1031US5075200AProcess of forming superconductive wiring stripMITSUBISHI METAL CORP·Filed 1988·Granted Dec 24, 1991·3 cites·10 claims
- 1131US5049452ATarget member used for formation of superconducting filmMITSUBISHI METAL CORP·Filed 1988·Granted Sep 17, 1991·2 cites·5 claims
- 1229US5059585AMethod of making a sputtering target for a bismuth based superconductorMITSUBISHI METAL CORP·Filed 1989·Granted Oct 22, 1991·2 cites·15 claims
Join the waitlist — get patent alerts
Get an alert when Tadashi Sugihara files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →