Inventor · disambiguated record
Takanobu Takeda
Also filed as: TAKEDA TAKANOBU
50 granted patents·12 pending applications·758 citations·filing 1996–2015
98Inventor score
Top patents by PatentIndex Score
62 records- 0199US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
- 0296US9075306B2Chemically amplified negative resist composition and patterning processTAKEDA TAKANOBU·Filed 2011·Granted Jul 7, 2015·22 cites·8 claims
- 0395US8343694B2Photomask blank, resist pattern forming process, and photomask preparation processSHINETSU CHEMICAL CO·Filed 2011·Granted Jan 1, 2013·11 cites·6 claims
- 0494US7416833B2Photoresist undercoat-forming material and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Aug 26, 2008·17 cites·19 claims
- 0593US9448482B2Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Sep 20, 2016·9 cites·9 claims
- 0693US6746817B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 8, 2004·49 cites·18 claims
- 0792US7977027B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 12, 2011·15 cites·3 claims
- 0892US7745104B2Bottom resist layer composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 29, 2010·15 cites·10 claims
- 0991US7449277B2Positive resist compositions and patterning processSHIN ETSU CHEMICAL C LTD·Filed 2006·Granted Nov 11, 2008·23 cites·14 claims
- 1090US8889810B2Adhesive composition and adhesive dry filmTAKEDA TAKANOBU·Filed 2012·Granted Nov 18, 2014·8 cites·11 claims
- 1190US6919161B2Silicon-containing polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Jul 19, 2005·32 cites·19 claims
- 1289US8729148B2Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic partsASAI SATOSHI·Filed 2010·Granted May 20, 2014·12 cites·17 claims
- 1387US6902772B2Silicon-containing polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Jun 7, 2005·23 cites·9 claims
- 1487US6455223B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 24, 2002·28 cites·14 claims
- 1586US6593056B2Chemically amplified positive resist composition and patterning methodSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 15, 2003·26 cites·17 claims
- 1683US8263308B2Polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formationTAGAMI SHOHEI·Filed 2010·Granted Sep 11, 2012·6 cites·10 claims
- 1783US7491483B2Polymers, positive resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Feb 17, 2009·6 cites·8 claims
- 1882US7501223B2Polymer, resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 10, 2009·20 cites·23 claims
- 1981US8697333B2Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective filmSOGA KYOKO·Filed 2011·Granted Apr 15, 2014·5 cites·15 claims
- 2081US8378148B2Alcoholic hydroxyl-containing compounds and making methodSHINETSU CHEMICAL CO·Filed 2010·Granted Feb 19, 2013·2 cites·2 claims
- 2180US8481244B2Epoxy-containing polymer, photo-curable resin composition, patterning process, and electric/electronic part protective filmTAKEDA TAKANOBU·Filed 2010·Granted Jul 9, 2013·5 cites·9 claims
- 2278US8110335B2Resist patterning process and manufacturing photo maskTAKEDA TAKANOBU·Filed 2009·Granted Feb 7, 2012·6 cites·9 claims
- 2378US6414101B1Dendritic polymers and making methodSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 2, 2002·20 cites·20 claims
- 2476US6994946B2Silicon-containing polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2004·Granted Feb 7, 2006·32 cites·11 claims
- 2575US6949323B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 27, 2005·13 cites·12 claims
- 2674US6869748B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 22, 2005·12 cites·14 claims
- 2773US7618763B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Nov 17, 2009·4 cites·3 claims
- 2872US8252518B2Chemically amplified positive resist composition and resist patterning processTANAKA AKINOBU·Filed 2009·Granted Aug 28, 2012·3 cites·3 claims
- 2972US7232638B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Jun 19, 2007·11 cites·18 claims
- 3071US7655378B2Negative resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Feb 2, 2010·2 cites·13 claims
- 3169US7476486B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Jan 13, 2009·2 cites·5 claims
- 3268US6835804B2Preparation of polymer, and resist composition using the polymerSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 28, 2004·8 cites·14 claims
- 3365US7887991B2Positive resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2009·Granted Feb 15, 2011·7 cites·25 claims
- 3464US8202677B2Chemically-amplified positive resist composition and patterning process thereofTAKEDA TAKANOBU·Filed 2009·Granted Jun 19, 2012·7 cites·24 claims
- 3561US6682869B2Chemical amplification, positive resist compositionsSHIN ETU CHEMICAL CO LTD·Filed 2001·Granted Jan 27, 2004·7 cites·19 claims
- 3659US6994945B2Silicon-containing polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Feb 7, 2006·5 cites·37 claims
- 3757US6838224B2Chemical amplification, positive resist compositionsSHI ETSU CHEMICAL CO LTD·Filed 2001·Granted Jan 4, 2005·5 cites·19 claims
- 3855US8367295B2Preparation process of chemically amplified resist compositionSHINETSU CHEMICAL CO·Filed 2008·Granted Feb 5, 2013·0 cites·7 claims
- 3955US7267923B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2004·Granted Sep 11, 2007·8 cites·9 claims
- 4055US7135269B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2004·Granted Nov 14, 2006·2 cites·14 claims
- 4155US6641975B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Nov 4, 2003·12 cites·7 claims
- 4254US2008305411A1Photomask blank, resist pattern forming process, and photomask preparation processSHINETSU CHEMICAL CO·Filed 2008·Application pending·0 cites
- 4354US2008241751A1Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Application pending·0 cites
- 4451US6861198B2Negative resist material and pattern formation method using the sameSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 1, 2005·9 cites·22 claims
- 4551US6653044B2Chemical amplification type resist compositionSHINETSU CHEMICAL CO·Filed 2001·Granted Nov 25, 2003·10 cites·5 claims
- 4648US7923195B2Positive resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2009·Granted Apr 12, 2011·2 cites·25 claims
- 4748US2009214960A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2009·Application pending·0 cites
- 4848US2017022300A1Continuous reaction apparatus and method of continuous polymerization using the sameHORIBA STEC CO LTD·Filed 2014·Application pending·0 cites
- 4947US8193307B2Synthesis of photoresist polymerTAKEDA TAKANOBU·Filed 2008·Granted Jun 5, 2012·0 cites·9 claims
- 5047US2008020289A1Novel polymer, positive resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
Showing the top 50 of 62 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →