Inventor · disambiguated record
Tatehito Usui
Also filed as: USUI TATEHITO
64 granted patents·18 pending applications·1,691 citations·filing 1991–2022
99Inventor score
Top patents by PatentIndex Score
82 records- 0198US6755932B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2001·Granted Jun 29, 2004·290 cites·11 claims
- 0298US5242539APlasma treatment method and apparatusHITACHI LTD·Filed 1992·Granted Sep 7, 1993·602 cites·76 claims
- 0396US10008370B2Plasma processing apparatus and operation method thereofHITACHI HIGH TECH CORP·Filed 2015·Granted Jun 26, 2018·23 cites·5 claims
- 0496US6503364B1Plasma processing apparatusHITACHI LTD·Filed 2000·Granted Jan 7, 2003·92 cites·7 claims
- 0594US11437289B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Sep 6, 2022·4 cites·6 claims
- 0694US6815228B2Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring methodHITACHI LTD·Filed 2001·Granted Nov 9, 2004·60 cites·7 claims
- 0794US6373681B2Electrostatic chuck, and method of and apparatus for processing sample using the chuckHITACHI LTD·Filed 2001·Granted Apr 16, 2002·67 cites·2 claims
- 0892US9934946B2Plasma processing apparatus and operating method of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Apr 3, 2018·9 cites·5 claims
- 0992US6427621B1Plasma processing device and plasma processing methodHITACHI LTD·Filed 2000·Granted Aug 6, 2002·42 cites·27 claims
- 1091US10453695B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Oct 22, 2019·7 cites·5 claims
- 1191US5895586APlasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminumHITACHI LTD·Filed 1995·Granted Apr 20, 1999·74 cites·5 claims
- 1290US5946184AElectrostatic chuck, and method of and apparatus for processing sampleHITACHI LTD·Filed 1997·Granted Aug 31, 1999·87 cites·6 claims
- 1388US6903826B2Method and apparatus for determining endpoint of semiconductor element fabricating processHITACHI LTD·Filed 2001·Granted Jun 7, 2005·33 cites·20 claims
- 1486US7259866B2Semiconductor fabricating apparatus with function of determining etching processing stateHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 21, 2007·9 cites·4 claims
- 1586US6961131B2Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring methodHITACHI LTD·Filed 2004·Granted Nov 1, 2005·24 cites·6 claims
- 1686US6759253B2Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring unitsHITACHI LTD·Filed 2001·Granted Jul 6, 2004·27 cites·33 claims
- 1785US10672595B2Plasma processing apparatus and operation method thereofHITACHI HIGH TECH CORP·Filed 2018·Granted Jun 2, 2020·3 cites·10 claims
- 1884US11915951B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Feb 27, 2024·1 cites·5 claims
- 1984US10665516B2Etching method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted May 26, 2020·3 cites·8 claims
- 2082US8747608B2Plasma processing apparatusUSUI TATEHITO·Filed 2011·Granted Jun 10, 2014·6 cites·7 claims
- 2182US6243251B1Electrostatic chuck, and method of and apparatus for processing sample using the chuckHITACHI LTD·Filed 1999·Granted Jun 5, 2001·50 cites·2 claims
- 2281US9741629B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Aug 22, 2017·3 cites·6 claims
- 2381US7411684B2Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring methodHITACHI LTD·Filed 2007·Granted Aug 12, 2008·5 cites·13 claims
- 2480US11152237B2Substitute sample, method for determining control parameter of processing, and measurement systemHITACHI LTD·Filed 2019·Granted Oct 19, 2021·2 cites·13 claims
- 2580US7126697B2Method and apparatus for determining endpoint of semiconductor element fabricating processHITACHI LTD·Filed 2006·Granted Oct 24, 2006·5 cites·8 claims
- 2679US8088247B2Plasma processing apparatusUSUI TATEHITO·Filed 2006·Granted Jan 3, 2012·5 cites·2 claims
- 2778US6537832B2Measuring apparatus and film formation methodHITACHI LTD·Filed 2001·Granted Mar 25, 2003·18 cites·18 claims
- 2877US6750977B2Apparatus for monitoring thickness of deposited layer in reactor and dry processing methodHITACHI LTD·Filed 2001·Granted Jun 15, 2004·16 cites·8 claims
- 2975US7230720B2Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring methodHITACHI LTD·Filed 2005·Granted Jun 12, 2007·3 cites·14 claims
- 3075US6923885B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2003·Granted Aug 2, 2005·11 cites·19 claims
- 3173US6716300B2Emission spectroscopic processing apparatusHITACHI LTD·Filed 2002·Granted Apr 6, 2004·8 cites·5 claims
- 3272US11239097B2Etching apparatus and etching method and detecting apparatus of film thicknessHITACHI HIGH TECH CORP·Filed 2019·Granted Feb 1, 2022·1 cites·11 claims
- 3371US7686917B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2007·Granted Mar 30, 2010·2 cites·7 claims
- 3471US7455790B2Emission spectroscopic processing apparatus and plasma processing method using itHITACHI LTD·Filed 2005·Granted Nov 25, 2008·2 cites·6 claims
- 3569US6972848B2Semiconductor fabricating apparatus with function of determining etching processing stateHITACH HIGH TECHNOLOGIES CORP·Filed 2003·Granted Dec 6, 2005·11 cites·5 claims
- 3669US6890771B2Plasma processing method using spectroscopic processing unitHITACHI HIGH TECH CORP·Filed 2003·Granted May 10, 2005·6 cites·13 claims
- 3767US10020233B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2013·Granted Jul 10, 2018·2 cites·3 claims
- 3866US12131964B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Granted Oct 29, 2024·0 cites·12 claims
- 3965US11287782B2Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement methodHITACHI LTD·Filed 2018·Granted Mar 29, 2022·1 cites·10 claims
- 4065US9865439B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jan 9, 2018·1 cites·4 claims
- 4165US8083888B2Plasma processing apparatusUSUI TATEHITO·Filed 2008·Granted Dec 27, 2011·2 cites·2 claims
- 4265US7009715B2Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processedHITACHI LTD·Filed 2004·Granted Mar 7, 2006·7 cites·21 claims
- 4363US6967109B2Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring unitsHITACHI LTD·Filed 2004·Granted Nov 22, 2005·6 cites·6 claims
- 4462US8197634B2Plasma processing apparatusYOKOGAWA KENETSU·Filed 2007·Granted Jun 12, 2012·1 cites·21 claims
- 4559US8425786B2Plasma etching method and plasma etching apparatusSATAKE MAKOTO·Filed 2010·Granted Apr 23, 2013·1 cites·9 claims
- 4658US6830649B2Apparatus and method for producing semiconductorsHITACHI LTD·Filed 2002·Granted Dec 14, 2004·6 cites·25 claims
- 4757US9767997B2Plasma processing apparatus and operational method thereofHITACHI HIGH TECH CORP·Filed 2014·Granted Sep 19, 2017·0 cites·6 claims
- 4857US6835665B2Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the methodHITACHI HIGH TECH CORP·Filed 2002·Granted Dec 28, 2004·5 cites·21 claims
- 4956US7169254B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2003·Granted Jan 30, 2007·3 cites·13 claims
- 5056US6596551B1Etching end point judging method, etching end point judging device, and insulating film etching method using these methodsHITACHI LTD·Filed 1999·Granted Jul 22, 2003·17 cites·15 claims
Showing the top 50 of 82 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →