Inventor · disambiguated record
Takako Yamaguchi
Also filed as: YAMAGUCHI TAKAKO
28 granted patents·16 pending applications·494 citations·filing 2000–2019
97Inventor score
Top patents by PatentIndex Score
44 records- 0196US6408123B1Near-field optical probe having surface plasmon polariton waveguide and method of preparing the same as well as microscope, recording/regeneration apparatus and micro-fabrication apparatus using the sameCANON KK·Filed 2000·Granted Jun 18, 2002·161 cites·11 claims
- 0295US6559926B2Pattern forming apparatus and pattern forming methodCANON KK·Filed 2001·Granted May 6, 2003·49 cites·16 claims
- 0393US6628392B2Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereofCANON KK·Filed 2001·Granted Sep 30, 2003·54 cites·35 claims
- 0491US7733491B2Sensor device and testing method utilizing localized plasmon resonanceCANON KK·Filed 2008·Granted Jun 8, 2010·14 cites·6 claims
- 0591US7399445B2Chemical sensorCANON KK·Filed 2003·Granted Jul 15, 2008·39 cites·16 claims
- 0690US6720115B2Exposure method and exposure apparatus using near-field light and exposure maskCANON KK·Filed 2001·Granted Apr 13, 2004·35 cites·17 claims
- 0786US7022463B2Near-field exposure photoresist and fine pattern forming method using the sameCANON KK·Filed 2004·Granted Apr 4, 2006·19 cites·11 claims
- 0886US6849391B2Photoresist, photolithography method using the same, and method for producing photoresistCANON KK·Filed 2002·Granted Feb 1, 2005·20 cites·2 claims
- 0986US6632593B2Pattern-forming method using photomask, and pattern-forming apparatusCANON KK·Filed 2001·Granted Oct 14, 2003·22 cites·11 claims
- 1084US7863061B2Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser arrayCANON KK·Filed 2009·Granted Jan 4, 2011·6 cites·15 claims
- 1183US7659039B2Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming methodCANON KK·Filed 2006·Granted Feb 9, 2010·6 cites·11 claims
- 1281US8068529B2Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser arrayIKUTA MITSUHIRO·Filed 2010·Granted Nov 29, 2011·4 cites·10 claims
- 1381US6785445B2Near field light probe, near field optical microscope, near field light lithography apparatus, and near field light storage apparatus that have the near field light probeCANON KK·Filed 2002·Granted Aug 31, 2004·31 cites·11 claims
- 1479US7547503B2Photosensitive silane coupling agent, method of forming pattern, and method of fabricating deviceCANON KK·Filed 2007·Granted Jun 16, 2009·5 cites·14 claims
- 1577US7419763B2Near-field exposure photoresist and fine pattern forming method using the sameCANON KK·Filed 2007·Granted Sep 2, 2008·3 cites·2 claims
- 1672US8249229B2Communication terminal, and dial registration method and dial registration program thereforHOUMURA TOSHIKAZU·Filed 2010·Granted Aug 21, 2012·3 cites·6 claims
- 1763US7615332B2Photosensitive compound, photosensitive composition, resist pattern forming method, and device production processCANON KK·Filed 2008·Granted Nov 10, 2009·0 cites·13 claims
- 1863US2009233232A1Photosensitive compound, photosensitive composition, resist pattern forming method, and device production processCANON KK·Filed 2009·Application pending·0 cites
- 1962US7691540B2Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing methodCANON KK·Filed 2004·Granted Apr 6, 2010·6 cites·2 claims
- 2059US7592108B2Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the sameCANON KK·Filed 2004·Granted Sep 22, 2009·5 cites·3 claims
- 2159US7190438B2Near-field exposure apparatus and near-field exposure photomaskCANON KK·Filed 2004·Granted Mar 13, 2007·5 cites·2 claims
- 2258US8019061B2Communication terminal, and dial registration method and dial registration program thereforFUJITSU LTD·Filed 2004·Granted Sep 13, 2011·3 cites·14 claims
- 2358US7136145B2Pattern-forming apparatus using a photomaskCANON KK·Filed 2003·Granted Nov 14, 2006·4 cites·4 claims
- 2455US2009303257A1Mobile terminal device and display control methodFUJITSU LTD·Filed 2009·Application pending·0 cites
- 2554US7776509B2Photosensitive compound, photosensitive composition, resist pattern forming method, and device production processCANON KK·Filed 2008·Granted Aug 17, 2010·0 cites·8 claims
- 2654US7303859B2Photoresist, photolithography method using the same, and method for producing photoresistCANON KK·Filed 2006·Granted Dec 4, 2007·0 cites·3 claims
- 2753US2007275327A1Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing methodCANON KK·Filed 2007·Application pending·0 cites
- 2852US2006078818A1Near-field exposure photoresist and fine pattern forming method using the sameCANON KK·Filed 2005·Application pending·0 cites
- 2951US8744526B2Communication terminal, and dial registration method and dial registration program thereforHOUMURA TOSHIKAZU·Filed 2006·Granted Jun 3, 2014·0 cites·3 claims
- 3051US8588857B2Communication terminal, and dial registration method and dial registration program thereforHOUMURA TOSHIKAZU·Filed 2006·Granted Nov 19, 2013·0 cites·4 claims
- 3148US7704672B2Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating deviceCANON KK·Filed 2007·Granted Apr 27, 2010·0 cites·7 claims
- 3248US2005221222A1Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing methodCANON KK·Filed 2005·Application pending·0 cites
- 3347US7651834B2Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device productionCANON KK·Filed 2007·Granted Jan 26, 2010·0 cites·5 claims
- 3446US2008085479A1Pattern forming method and device production process using the methodCANON KK·Filed 2007·Application pending·0 cites
- 3545US2005053859A1Photoresist, photolithography method using the same, and method for producing photoresistCANON KK·Filed 2004·Application pending·0 cites
- 3645US2008107998A1Near-field exposure method and device manufacturing method using the sameCANON KK·Filed 2007·Application pending·0 cites
- 3745US2008209321A1Mobile terminal apparatus, and display control method thereforFUJITSU LTD·Filed 2008·Application pending·0 cites
- 3844US2019286702A1Display control apparatus, display control method, and computer-readable recording mediumFUJITSU LTD·Filed 2019·Application pending·0 cites
- 3944US2006031782A1Terminal device, and message display method and program for the sameFUJITSU LTD·Filed 2004·Application pending·0 cites
- 4043US2006003269A1Resist pattern forming method, substrate processing method, and device manufacturing methodCANON KK·Filed 2005·Application pending·0 cites
- 4141US2006014108A1Resist pattern forming method based on near-field exposure, and substrate processing method and device manufacturing method using the resist pattern forming methodCANON KK·Filed 2005·Application pending·0 cites
- 4240US2005064301A1Mask manufacturing methodCANON KK·Filed 2004·Application pending·0 cites
- 4338US2004229425A1Semiconductor device and bump formation methodFiled 2004·Application pending·0 cites
- 4436US2002149118A1Semiconductor device and bump formation methodFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →