Inventor · disambiguated record
Taisuke Yonemura
Also filed as: YONEMURA TAISUKE
6 granted patents·3 pending applications·19 citations·filing 2001–2010
77Inventor score
Files withASAHI GLASS CO LTD2KANTO DENKA KOGYO KK2NAT INST OF ADVANCED IND SCIEN2BEPPU TATSURO1SAKAI KATSUO1
Top patents by PatentIndex Score
9 records- 0184US7919141B2Processes and equipments for preparing F2-containing gases, as well as process and equipments for modifying the surfaces of articlesKANTO DENKA KOGYO KK·Filed 2005·Granted Apr 5, 2011·8 cites·26 claims
- 0254US6787053B2Cleaning gases and etching gasesASAHI GLASS CO LTD·Filed 2001·Granted Sep 7, 2004·5 cites·27 claims
- 0353US2010206480A1Processes and equipments for preparing f2-containing gases, as well as processes and equipments for modifying the surfaces of articlesKANTO DENKA KOGYO KK·Filed 2010·Application pending·0 cites
- 0452US7332628B2Process for producing carbonyl fluorideNAT INST OF ADVANCED IND SCIEN·Filed 2004·Granted Feb 19, 2008·1 cites·23 claims
- 0549US7322368B2Plasma cleaning gas and plasma cleaning methodASAHI GLASS CO LTD·Filed 2002·Granted Jan 29, 2008·3 cites·6 claims
- 0641US8277560B2CVD apparatus and method of cleaning the CVD apparatusSAKAI KATSUO·Filed 2003·Granted Oct 2, 2012·2 cites·6 claims
- 0740US2005252451A1Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gasBEPPU TATSURO·Filed 2003·Application pending·0 cites
- 0839US7138364B2Cleaning gas and etching gasNAT INST OF ADVANCED IND SCIEN·Filed 2003·Granted Nov 21, 2006·0 cites·16 claims
- 0935US2004255854A1Cvd apparatus and method of cleaning the cvd apparatusFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →