Inventor · disambiguated record
Teppei Adachi
Also filed as: ADACHI TEPPEI
22 granted patents·5 pending applications·117 citations·filing 2013–2023
93Inventor score
Files withSHINETSU CHEMICAL CO27
Top patents by PatentIndex Score
27 records- 0198US9091918B2Sulfonium salt, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jul 28, 2015·58 cites·19 claims
- 0296US11340527B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted May 24, 2022·3 cites·16 claims
- 0395US11693314B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 4, 2023·4 cites·19 claims
- 0494US9846360B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Dec 19, 2017·10 cites·13 claims
- 0594US9360760B2Pattern forming process and shrink agentSHINETSU CHEMICAL CO·Filed 2015·Granted Jun 7, 2016·10 cites·10 claims
- 0692US9904169B2Photomask blank, resist pattern forming process, and method for making photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Feb 27, 2018·5 cites·13 claims
- 0791US12050402B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 30, 2024·2 cites·17 claims
- 0891US10012902B2Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 3, 2018·7 cites·6 claims
- 0990US11009793B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 18, 2021·4 cites·17 claims
- 1090US9429846B2Pattern forming process and shrink agentSHINETSU CHEMICAL CO·Filed 2014·Granted Aug 30, 2016·6 cites·8 claims
- 1187US10023674B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 17, 2018·3 cites·11 claims
- 1286US11262653B2Sulfonium salt, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Mar 1, 2022·3 cites·6 claims
- 1383US12072627B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2023·Granted Aug 27, 2024·0 cites·12 claims
- 1475US9760010B2Patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Sep 12, 2017·2 cites·11 claims
- 1563US10457761B2Polymer, resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Oct 29, 2019·0 cites·6 claims
- 1656US2016168296A1Polymer, resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2015·Application pending·0 cites
- 1754US10191373B2Method for producing polymerSHINETSU CHEMICAL CO·Filed 2016·Granted Jan 29, 2019·0 cites·7 claims
- 1852US9146464B2Sulfonium salt, polymer, polymer making method, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 29, 2015·0 cites·18 claims
- 1949US9829792B2Monomer, polymer, positive resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Nov 28, 2017·0 cites·12 claims
- 2049US9017931B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2013·Granted Apr 28, 2015·0 cites·11 claims
- 2148US10310376B2Resist composition, pattern forming process, polymer, and monomerSHINETSU CHEMICAL CO·Filed 2016·Granted Jun 4, 2019·0 cites·13 claims
- 2247US11662663B2Substrate protective film-forming composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted May 30, 2023·0 cites·15 claims
- 2345US2020140592A1Preparation of polymer and polymerSHINETSU CHEMICAL CO·Filed 2019·Application pending·0 cites
- 2444US10921710B2Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2018·Granted Feb 16, 2021·0 cites·6 claims
- 2536US2016147142A1Photomask blank, resist pattern forming process, and method for making photomaskSHINETSU CHEMICAL CO·Filed 2015·Application pending·0 cites
- 2636US2016229940A1Polymer, resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Application pending·0 cites
- 2734US2015346600A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →