Inventor · disambiguated record
Teh-Wei Ger
Also filed as: GER TEH-WEI
1 granted patent·1 pending application·8 citations·filing 2000–2006
31Inventor score
Technology areasH10P
Top patents by PatentIndex Score
2 records- 0154US6566263B1Method of forming an HDP CVD oxide layer over a metal line structure for high aspect ratio design ruleTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted May 20, 2003·8 cites·39 claims
- 0238US2008078420A1Method for post-cmp wafer surface cleaningSEMICONDUCTOR MFG INT SHANGHAI·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →