Inventor · disambiguated record
Teruaki Hayakawa
Also filed as: HAYAKAWA TERUAKI
9 granted patents·6 pending applications·23 citations·filing 2000–2024
81Inventor score
Files withTOKYO OHKA KOGYO CO LTD11DAICEL CHEM1OBER CHRISTOPHER K1TADA YASUHIKO1UNIV KYUSHU NAT UNIV CORP1
Top patents by PatentIndex Score
15 records- 0191US9169421B2Method of producing structure containing phase-separated structure, method of forming pattern, and top coat materialTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Oct 27, 2015·7 cites·12 claims
- 0280US9541830B2Block copolymers and lithographic patterning using sameOBER CHRISTOPHER K·Filed 2012·Granted Jan 10, 2017·4 cites·20 claims
- 0374US6350850B1Process for producing polyesterDAICEL CHEM·Filed 2000·Granted Feb 26, 2002·11 cites·17 claims
- 0473US2025011616A1Method for producing structure body including phase-separated structure, and compositionTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0572US2024360267A1Resin composition for forming etching mask pattern, and method for manufacturing etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0672US2025011622A1Block copolymer, undercoat agent, resin composition for forming phase-separated structure, and method for producing structure body including phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0772US2024361686A1Method for manufacturing etching mask pattern, and resin composition for forming etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0872US2024368393A1Resin composition for forming etching mask pattern, and method for manufacturing etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0963US11472956B2Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Oct 18, 2022·0 cites·5 claims
- 1061US9691961B2Thermoelectric conversion material using substrate having nanostructure, and method for producing sameUNIV KYUSHU NAT UNIV CORP·Filed 2013·Granted Jun 27, 2017·1 cites·13 claims
- 1155US11560444B2Method of producing block copolymer capable of creating specific structure patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Jan 24, 2023·0 cites·7 claims
- 1249US10941253B2Block copolymer, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Mar 9, 2021·0 cites·12 claims
- 1345US9850350B2Block copolymer, method of producing block copolymer, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Dec 26, 2017·0 cites·10 claims
- 1443US11261299B2Block copolymer and method of producing the same, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Mar 1, 2022·0 cites·5 claims
- 1531US2011281085A1Polymer thin film, patterned media, production methods thereof, and surface modifying agentsTADA YASUHIKO·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →