Inventor · disambiguated record
Teruo Nakata
Also filed as: NAKATA TERUO
9 granted patents·6 pending applications·9 citations·filing 2003–2019
78Inventor score
Top patents by PatentIndex Score
15 records- 0180US8538573B2Vacuum processing apparatus and programNAKATA TERUO·Filed 2011·Granted Sep 17, 2013·6 cites·8 claims
- 0260US9011065B2Vacuum processing apparatus and operating method of vacuum processing apparatusTAUCHI SUSUMU·Filed 2010·Granted Apr 21, 2015·1 cites·7 claims
- 0359US8849446B2Vacuum processing apparatus and programNAKATA TERUO·Filed 2011·Granted Sep 30, 2014·1 cites·8 claims
- 0459US2009043643A1Managerial decision support system and methodHITACHI LTD·Filed 2008·Application pending·0 cites
- 0558US8588962B2Vacuum processing device and method of transporting process subject memberHITACHI HIGH TECH CORP·Filed 2012·Granted Nov 19, 2013·1 cites·6 claims
- 0657US2004039585A1Managerial decision support system and methodFiled 2003·Application pending·0 cites
- 0748US9507328B2Processing chamber allocation setting device and processing chamber allocation setting programHITACHI HIGH TECH CORP·Filed 2013·Granted Nov 29, 2016·0 cites·9 claims
- 0847US11315064B2Information processing device and production instruction support methodHITACHI LTD·Filed 2019·Granted Apr 26, 2022·0 cites·2 claims
- 0944US2021365851A1Production plan schedule creation method and information processing deviceHITACHI LTD·Filed 2019·Application pending·0 cites
- 1043US2015194327A1Vacuum processing system and vacuum processing method of semiconductor processing substrateHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 1137US2014099176A1Vacuum processing apparatus and vacuum processing methodHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 1236US8812151B2Vacuum process device and vacuum process methodNAKATA TERUO·Filed 2012·Granted Aug 19, 2014·0 cites·12 claims
- 1335US9385016B2Semiconductor processing system and programNAKATA TERUO·Filed 2010·Granted Jul 5, 2016·0 cites·18 claims
- 1435US2011110752A1Vacuum processing system and vacuum processing method of semiconductor processing substrateHITACHI HIGH TECH CORP·Filed 2010·Application pending·0 cites
- 1529US9343340B2Vacuum processing apparatusNOGI KEITA·Filed 2011·Granted May 17, 2016·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →