Inventor · disambiguated record
Tetsuya Tatsumi
Also filed as: TATSUMI TETSUYA
22 granted patents·2 pending applications·393 citations·filing 1991–2019
95Inventor score
Files withSONY CORP15KUBOI NOBUYUKI4SONY SEMICONDUCTOR SOLUTIONS CORP2MAEDA KENSAKU1MATSUZAWA NOBUYUKI1
Top patents by PatentIndex Score
24 records- 0183US5378311AMethod of producing semiconductor deviceSONY CORP·Filed 1993·Granted Jan 3, 1995·84 cites·29 claims
- 0274US5200028AEtching process of silicon materialSONY CORP·Filed 1991·Granted Apr 6, 1993·55 cites·3 claims
- 0370US8535550B2Shape simulation apparatus, shape simulation program, semiconductor production apparatus, and semiconductor device production methodKUBOI NOBUYUKI·Filed 2010·Granted Sep 17, 2013·2 cites·12 claims
- 0469US5660681AMethod for removing sidewall protective filmSONY CORP·Filed 1996·Granted Aug 26, 1997·40 cites·3 claims
- 0569US5368686ADry etching method for W polycide using sulfur depositionSONY CORP·Filed 1992·Granted Nov 29, 1994·45 cites·15 claims
- 0668US5266154ADry etching methodSONY CORP·Filed 1992·Granted Nov 30, 1993·43 cites·6 claims
- 0767US8685856B2Solid-state imaging device, fabrication method thereof, imaging apparatus, and fabrication method of anti-reflection structureMAEDA KENSAKU·Filed 2010·Granted Apr 1, 2014·2 cites·7 claims
- 0866US10403516B2Etching characteristic estimation method, program, information processing apparatus, processing apparatus, designing method, and production methodSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2015·Granted Sep 3, 2019·1 cites·13 claims
- 0966US7473646B2Dry etching method and production method of magnetic memory deviceSONY CORP·Filed 2004·Granted Jan 6, 2009·8 cites·5 claims
- 1063US7808026B2Dry etching method and production method of magnetic memory deviceSONY CORP·Filed 2008·Granted Oct 5, 2010·1 cites·8 claims
- 1160US5362361ADry etching methodSONY CORP·Filed 1992·Granted Nov 8, 1994·30 cites·8 claims
- 1260US5180464ADry etching methodSONY CORP·Filed 1991·Granted Jan 19, 1993·29 cites·5 claims
- 1354US8747685B2Shape simulation apparatus, shape simulation program, semiconductor production apparatus, and semiconductor device production methodSONY CORP·Filed 2013·Granted Jun 10, 2014·0 cites·9 claims
- 1454US5354421ADry etching methodSONY CORP·Filed 1992·Granted Oct 11, 1994·23 cites·19 claims
- 1553US10998174B2Dry etching equipment and method for producing semiconductor deviceKUBOI NOBUYUKI·Filed 2008·Granted May 4, 2021·0 cites·10 claims
- 1649US12062548B2Etching method for oxide semiconductor filmSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2019·Granted Aug 13, 2024·0 cites·6 claims
- 1749US7439068B2Plasma monitoring method, plasma processing method, method of manufacturing semiconductor device, and plasma processing systemSONY CORP·Filed 2004·Granted Oct 21, 2008·2 cites·5 claims
- 1848US5211790ADry etching method by sulfur conditioningSONY CORP·Filed 1992·Granted May 18, 1993·17 cites·5 claims
- 1945US9411914B2Simulator, processing system, damage evaluation method and damage evaluation programKUBOI NOBUYUKI·Filed 2011·Granted Aug 9, 2016·0 cites·17 claims
- 2043US9287097B2Predicting ultraviolet ray damage with visible wavelength spectroscopy during a semiconductor manufacturing processSONY CORP·Filed 2012·Granted Mar 15, 2016·0 cites·14 claims
- 2142US2007298615A1Pattern forming method and method of manufacturing semiconductor devicesMATSUZAWA NOBUYUKI·Filed 2007·Application pending·0 cites
- 2240US5227341AMethod of manufacturing a semiconductor device using an isopropyl alcohol ashing stepSONY CORP·Filed 1992·Granted Jul 13, 1993·11 cites·7 claims
- 2340US2005247672A1Plasma etching methodTATSUMI TETSUYA·Filed 2005·Application pending·0 cites
- 2438US8649893B2Semiconductor manufacturing device, semiconductor device manufacturing method, simulation device, and simulation programKUBOI NOBUYUKI·Filed 2010·Granted Feb 11, 2014·0 cites·19 claims
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