Inventor · disambiguated record
Teruhiro Uematsu
Also filed as: UEMATSU TERUHIRO
6 granted patents·2 pending applications·19 citations·filing 2005–2021
74Inventor score
Top patents by PatentIndex Score
8 records- 0186US8426107B2Positive-type photosensitive compositionTAKAHASHI MOTOKI·Filed 2009·Granted Apr 23, 2013·13 cites·14 claims
- 0268US11929284B2Protective film forming agent for plasma dicing and method for manufacturing semiconductor chipTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Mar 12, 2024·2 cites·11 claims
- 0349US7662541B2Photosensitive resin composition and photosensitive dry film by the use thereofTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Feb 16, 2010·4 cites·5 claims
- 0446US10061195B2Photosensitive resin composition for dry etching, and method for producing resist pattern for dry etchingTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Aug 28, 2018·0 cites·5 claims
- 0546US2024010829A1Polymerizable composition and manufacturing method for element-mounted substrateTOKYO OHKA KOGYO CO LTD·Filed 2021·Application pending·0 cites
- 0645US10301438B2Dispersion liquid used for forming porous film, porous film, power storage element, and method for producing porous filmTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted May 28, 2019·0 cites·12 claims
- 0745US10208163B2Method of producing polyimide resin, method of producing polyimide coating, method of producing polyamic acid solution, polyimide coating, and polyamic acid solutionTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Feb 19, 2019·0 cites·8 claims
- 0837US2007264601A1Photosensitive Resin Composition and Photosensitive Dry Film by the Use ThereofTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →